Gd-doping of HfO2

An increase in the density of states between the oxygen 2p bands and the Fermi level is seen with increasing Gd concentrations. In addition, for the Gd-doped HfO2 films, the Gd 4f photoexcitation peak at 5.5 eV below the valence band maximum was identified using resonant photoemission. Electrical me...

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Bibliographic Details
Published in:Applied surface science Vol. 254; no. 14; pp. 4308 - 4312
Main Authors: KETSMAN, Ihor, LOSOVYJ, Ya. B, SOKOLOV, A, JINKE TANG, ZHENJUN WANG, NATTA, M. L, BRAND, J. I, DOWBEN, P. A
Format: Conference Proceeding Journal Article
Language:English
Published: Amsterdam Elsevier Science 15-05-2008
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Summary:An increase in the density of states between the oxygen 2p bands and the Fermi level is seen with increasing Gd concentrations. In addition, for the Gd-doped HfO2 films, the Gd 4f photoexcitation peak at 5.5 eV below the valence band maximum was identified using resonant photoemission. Electrical measurements show pronounced rectification properties for lightly-doped Gd:HfO2 films on p-Si and for heavily-doped Gd:HfO2 films on n-Si, suggesting a crossover from n-type to p-type behavior with increasing doping level. In addition, there is an increase in the reverse bias current with neutron irradiation.
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ISSN:0169-4332
1873-5584
DOI:10.1016/j.apsusc.2008.01.060