Analysis of Magnetic Field and Discharge Plasma for HTS Magnetron Sputtering Apparatus

The magnetron sputtering apparatus with high magnetic field could be used to fabricate special films. In order to investigate the typical plasma distribution of high field magnetron and further improve the film quality, a newly HTS (high temperature superconductivity) rectangular planar magnetron wi...

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Bibliographic Details
Published in:	IEEE transactions on applied superconductivity Vol. 20; no. 3; pp. 1017 - 1020
Main Authors:	Qiu, Qingquan, Xiao, Liye, Huang, Tianbin, Zhang, Guomin, Li, Xiaohang
Format:	Journal Article Conference Proceeding
Language:	English
Published:	New York, NY IEEE 01-06-2010 Institute of Electrical and Electronics Engineers The Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subjects:	Applied sciences Coating Computer simulation Electric discharges Electric fields Electrical engineering. Electrical power engineering Electromagnets Electronic tubes, masers Electronics Exact sciences and technology high temperature superconductivity High temperature superconductors Magnetic analysis magnetic field Magnetic fields Magnetic films Magnetron sputtering Mathematical analysis Microelectronic fabrication (materials and surfaces technology) Monte Carlo methods plasma Plasma simulation Plasma temperature Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices Sputtering Superconducting films Superconducting magnets Superconductivity Temperature distribution Various equipment and components Monte Carlo method Plasma Particle in cell method Magnetron Anode Instrumentation magnetron sputtering high temperature superconductivity Coatings Microwave tube Finite element method Plasma simulation Microelectronic fabrication Electric field High field Physical vapor deposition Numerical simulation System simulation Cathodic sputtering Coating Magnetic field High temperature superconductor Mechanical shock Planar technology
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