Analysis of Magnetic Field and Discharge Plasma for HTS Magnetron Sputtering Apparatus

• Published in: IEEE transactions on applied superconductivity Vol. 20; no. 3; pp. 1017 - 1020
• Main Authors: Qiu, Qingquan, Xiao, Liye, Huang, Tianbin, Zhang, Guomin, Li, Xiaohang
• Format: Journal Article Conference Proceeding
• Language: English
• Published: New York, NY IEEE 01-06-2010; Institute of Electrical and Electronics Engineers; The Institute of Electrical and Electronics Engineers, Inc. (IEEE)
• Subjects: Applied sciences; Coating; Computer simulation; Electric discharges; Electric fields; Electrical engineering. Electrical power engineering; Electromagnets; Electronic tubes, masers; Electronics; Exact sciences and technology; high temperature superconductivity; High temperature superconductors; Magnetic analysis; magnetic field; Magnetic fields; Magnetic films; Magnetron sputtering; Mathematical analysis; Microelectronic fabrication (materials and surfaces technology); Monte Carlo methods; plasma; Plasma simulation; Plasma temperature; Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices; Sputtering; Superconducting films; Superconducting magnets; Superconductivity; Temperature distribution; Various equipment and components; Monte Carlo method; Plasma; Particle in cell method; Magnetron; Anode; Instrumentation; magnetron sputtering; high temperature superconductivity; Coatings; Microwave tube; Finite element method; Plasma simulation; Microelectronic fabrication; Electric field; High field; Physical vapor deposition; Numerical simulation; System simulation; Cathodic sputtering; Coating; Magnetic field; High temperature superconductor; Mechanical shock; Planar technology
• ISSN: 1051-8223; 1558-2515
• DOI: 10.1109/TASC.2010.2044567

The magnetron sputtering apparatus with high magnetic field could be used to fabricate special films. In order to investigate the typical plasma distribution of high field magnetron and further improve the film quality, a newly HTS (high temperature superconductivity) rectangular planar magnetron with racetrack type coil is proposed. The magnetic field in the discharge space is calculated by finite element method, and it is one order higher than that of conventional magnetrons. Based on this, the simulation of magnetron discharge plasma is performed with PIC-MCC (particle-in-cell, Monte Carlo collision) method. The simulation results show that a large electric field region is formed in high magnetic field. Due to the additional electric field, the plasma is broadened to anode direction. Through theoretical analysis, magnetic field and plasma simulation, the disadvantages of current HTS magnetron are further pointed out, and it is discussed how to improve the HTS magnetron.