High density plasma chemical vapor deposition of diamond-like carbon films

High density plasma chemical vapor deposition of diamond-like carbon films

This work was based on the studies of the influence of the plasma process on the characteristics of diamond-like carbon (DLC) films deposited by high density plasma chemical vapor deposition (HDP-CVD). DLC is a material that shows several good characteristics like high electrical resistivity, lower...

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Bibliographic Details
Published in:Microelectronics Vol. 34; no. 5-8; pp. 627 - 629
Main Authors: Mousinho, A.P., Mansano, R.D., Massi, M., Zambom, L.S.
Format: Journal Article
Language:English
Published: Elsevier Ltd 01-05-2003
Subjects:
Micromachine
Polymer micromachine
Tridimentional structures
Micromachine
Tridimentional structures
Polymer micromachine
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Summary:This work was based on the studies of the influence of the plasma process on the characteristics of diamond-like carbon (DLC) films deposited by high density plasma chemical vapor deposition (HDP-CVD). DLC is a material that shows several good characteristics like high electrical resistivity, lower dielectric constant, high breakdown field, lower stress, high density, and hardness and chemical inertness. This material is important actually in mechanic, optic, and chemistry and mainly in microelectronic areas. For microelectronic process the best results were obtained by plasma of pure methane: low dielectric constant (1.7) and high resistivity 5×1013Ωcm.
ISSN:1879-2391
1879-2391
DOI:10.1016/S0026-2692(03)00065-X