Radiation hardness of silicon detectors based on pre-irradiated silicon

Radiation hardness of planar detectors processed from pre-irradiated and thermo-annealed n-type FZ silicon substrates, and standard FZ as a reference, was studied. The high purity n-Si wafers with carrier concentration 4.8×10 11 cm −3 were pre-irradiated in Kiev's nuclear research reactor by fa...

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Published in:Nuclear instruments & methods in physics research. Section A, Accelerators, spectrometers, detectors and associated equipment Vol. 568; no. 1; pp. 78 - 82
Main Authors: Litovchenko, P.G., Groza, A.A., Lastovetsky, V.F., Barabash, L.I., Starchik, M.I., Dubovoy, V.K., Bisello, D., Giubilato, P., Candelori, A., Rando, R., Litovchenko, A.P., Khomenkov, V., Wahl, W., Boscardin, M., Zorzi, N., Dalla Betta, G.-F., Cindro, V., Mikelsen, M., Monakhov, E.V., Svensson, B.G.
Format: Journal Article
Language:English
Published: Elsevier B.V 30-11-2006
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Summary:Radiation hardness of planar detectors processed from pre-irradiated and thermo-annealed n-type FZ silicon substrates, and standard FZ as a reference, was studied. The high purity n-Si wafers with carrier concentration 4.8×10 11 cm −3 were pre-irradiated in Kiev's nuclear research reactor by fast neutrons to fluence of about 10 16 neutrons/cm 2 and thermo-annealed at a temperature of about 850 °C. Silicon diodes were fabricated from standard and pre-irradiated silicon substrates by IRST (Italy). All diodes were subsequently irradiated by fast neutrons at Kiev and Ljubljana nuclear reactors. The dependence of the effective doping concentration as a function of fluence ( N eff =f( Φ)) was measured for reference and pre-irradiated diodes. Pre-irradiation of silicon improves the radiation hardness by decreasing the acceptor introduction rate ( β), thus mitigating the depletion voltage ( V dep) increase. In particular, β in reference samples is about 0.017 cm −1, and for pre-irradiated samples is about 0.008 cm −1. Therefore, the method of preliminary irradiation can be useful to increase the radiation hardness of silicon devices to be used as sensors or detectors in harsh radiation environments.
ISSN:0168-9002
1872-9576
DOI:10.1016/j.nima.2006.05.207