Report on the 47th IUVSTA Workshop 'Angle-Resolved XPS: the current status and future prospects for angle-resolved XPS of nano and subnano films'

A summary of the workshop entitled ‘Angle‐Resolved XPS: The Current Status and Future Prospects for Angle‐resolved XPS of Nano and Subnano Films’ is given, which was held at the Riviera Maya, Mexico, 26–30 March 2007, under the main sponsorship of the International Union for Vacuum Science, Techniqu...

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Bibliographic Details

Published in:	Surface and interface analysis Vol. 41; no. 11; pp. 840 - 857
Main Authors:	Herrera-Gomez, A., Grant, J. T., Cumpson, P. J., Jenko, M., Aguirre-Tostado, F. S., Brundle, C. R., Conard, T., Conti, G., Fadley, C. S., Fulghum, J., Kobayashi, K., Kövér, L., Nohira, H., Opila, R. L., Oswald, S., Paynter, R. W., Wallace, R. M., Werner, W. S. M., Wolstenholme, J.
Format:	Journal Article
Language:	English
Published:	Chichester, UK John Wiley & Sons, Ltd 01-11-2009
Subjects:	angle-resolved X-ray photoelectron spectroscopy ARXPS hard X-ray photoemission IUVSTA workshop maximum entropy near-surface analysis non-destructive depth profiling stratification surface analysis X-ray photoelectron spectroscopy XPS
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