Report on the 47th IUVSTA Workshop 'Angle-Resolved XPS: the current status and future prospects for angle-resolved XPS of nano and subnano films'

• Published in: Surface and interface analysis Vol. 41; no. 11; pp. 840 - 857
• Main Authors: Herrera-Gomez, A., Grant, J. T., Cumpson, P. J., Jenko, M., Aguirre-Tostado, F. S., Brundle, C. R., Conard, T., Conti, G., Fadley, C. S., Fulghum, J., Kobayashi, K., Kövér, L., Nohira, H., Opila, R. L., Oswald, S., Paynter, R. W., Wallace, R. M., Werner, W. S. M., Wolstenholme, J.
• Format: Journal Article
• Language: English
• Published: Chichester, UK John Wiley & Sons, Ltd 01-11-2009
• Subjects: angle-resolved X-ray photoelectron spectroscopy; ARXPS; hard X-ray photoemission; IUVSTA workshop; maximum entropy; near-surface analysis; non-destructive depth profiling; stratification; surface analysis; X-ray photoelectron spectroscopy; XPS
• ISSN: 0142-2421; 1096-9918
• DOI: 10.1002/sia.3105

A summary of the workshop entitled ‘Angle‐Resolved XPS: The Current Status and Future Prospects for Angle‐resolved XPS of Nano and Subnano Films’ is given, which was held at the Riviera Maya, Mexico, 26–30 March 2007, under the main sponsorship of the International Union for Vacuum Science, Technique and Applications (IUVSTA). Angle‐resolved X‐ray photoelectron spectroscopy (ARXPS) can provide detailed chemical as well as depth profile information about the near‐surface composition of materials and thin films. This workshop was held to review the present status and level of understanding of Angle‐resolved XPS, and to stimulate discussions leading to a deeper understanding of current problems and new solutions. The main goal of the workshop was to find better ways to perform experiments and, very importantly, better ways to extract information from the experimental data. This report contains summaries of presentations and discussions that were held in sessions entitled ‘Basics and Present Limits of ARXPS’, the Analysis of ARXPS Data, Applications of ARXPS, Equipment for ARXPS, and Future Developments in ARXPS'. There were 33 participants at the workshop. Copyright © 2009 John Wiley & Sons, Ltd.