Application-driven development of plasma source technology
This article reviews major developments in etch- and deposition-driven plasma source technology over the past decades. We first review the radio-frequency parallel plate diode, summarizing its great impact but also its inherent problems. Ensuing sections then treat microwave plasma generation, elect...
Saved in:
| Published in: | Journal of vacuum science & technology. A, Vacuum, surfaces, and films Vol. 21; no. 5; pp. S139 - S144 |
|---|---|
| Main Authors: | , |
| Format: | Journal Article |
| Language: | English |
| Published: |
01-09-2003
|
| Online Access: | Get full text |
| Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
| Summary: | This article reviews major developments in etch- and deposition-driven plasma source technology over the past decades. We first review the radio-frequency parallel plate diode, summarizing its great impact but also its inherent problems. Ensuing sections then treat microwave plasma generation, electron cyclotron resonance power transfer enhancement, inductively coupled plasma sources, and (very briefly) the radio-frequency helicon source. We then introduce the important and relatively new issues of control of the ion energy distribution function and the tailoring of plasma chemistry, including the decoupling of chemistry from pressure and power. The emerging areas of ambient pressure plasma sources and miniature “plasmas on a chip” are summarized, and we conclude with a brief view to the future. |
|---|---|
| ISSN: | 0734-2101 1520-8559 |
| DOI: | 10.1116/1.1600448 |