Effect of partial pressure of oxygen, target current, and annealing on DC sputtered tungsten oxide (WO3) thin films for electrochromic applications

Tungsten oxide (WO3) thin films were prepared on Corning (CG) and Fluorine doped tin oxide (FTO) glass substrates at partial pressure of oxygen (pO2) 4 × 10−2 Pa and 8 × 10−2 Pa using DC magnetron sputtering (DCMs). In this work, we have varied the deposition parameters like pO2, target currents, an...

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Bibliographic Details

Published in:	Solid state ionics Vol. 399; p. 116275
Main Authors:	Kumar, K Naveen, Sattar, Sheik Abdul, Shaik, Habibuddin, G V, Ashok Reddy, Jafri, R. Imran, Dhananjaya, Merum, Pawar, Amruth S., Prakash, Nunna Guru, Premkumar, R., Ansar, Sabah, Chandrashekar, L.N., Aishwarya, P.
Format:	Journal Article
Language:	English
Published:	Elsevier B.V 15-10-2023
Subjects:	EC properties Optical transmittance pO2 Sputtering Target current Temperature Optical transmittance Temperature pO2 Target current Sputtering EC properties
Online Access:	Get full text
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