Near-field two-photon nanolithography using an apertureless optical probe

Near-field two-photon optical lithography is demonstrated by using ∼120 fs laser pulses at 790 nm in an apertureless near-field optical microscope, which produces lithographic features with ∼70 nm resolution. The technique takes advantage of the field enhancement at the extremity of a metallic probe...

Full description

Bibliographic Details

Published in:	Applied physics letters Vol. 81; no. 19; pp. 3663 - 3665
Main Authors:	Yin, Xiaobo, Fang, Nicholas, Zhang, Xiang, Martini, Ignacio B., Schwartz, Benjamin J.
Format:	Journal Article
Language:	English
Published:	04-11-2002
Online Access:	Get full text
Tags:	Add Tag No Tags, Be the first to tag this record!