Near-field two-photon nanolithography using an apertureless optical probe

Near-field two-photon nanolithography using an apertureless optical probe

Near-field two-photon optical lithography is demonstrated by using ∼120 fs laser pulses at 790 nm in an apertureless near-field optical microscope, which produces lithographic features with ∼70 nm resolution. The technique takes advantage of the field enhancement at the extremity of a metallic probe...

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Bibliographic Details
Published in:Applied physics letters Vol. 81; no. 19; pp. 3663 - 3665
Main Authors: Yin, Xiaobo, Fang, Nicholas, Zhang, Xiang, Martini, Ignacio B., Schwartz, Benjamin J.
Format: Journal Article
Language:English
Published: 04-11-2002
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Summary:Near-field two-photon optical lithography is demonstrated by using ∼120 fs laser pulses at 790 nm in an apertureless near-field optical microscope, which produces lithographic features with ∼70 nm resolution. The technique takes advantage of the field enhancement at the extremity of a metallic probe to induce nanoscale two-photon absorption and polymerization in a commercial photoresist, SU-8. Even without optimization of the resist or laser pulses, the spatial resolution of this technique is as high as λ/10, nearly a factor of 2 better than techniques based on far field two-photon lithography.
ISSN:0003-6951
1077-3118
DOI:10.1063/1.1519329