Plasma-chemical synthesis of transparent dielectric Si–C–O–H films from trimethylphenoxysilane

Plasma-chemical synthesis of transparent dielectric Si–C–O–H films from trimethylphenoxysilane

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Bibliographic Details
Published in:High energy chemistry Vol. 50; no. 3; pp. 224 - 227
Main Authors: Ermakova, E. N., Rumyantsev, Yu. M., Rakhlin, V. I., Kosinova, M. L.
Format: Journal Article
Language:English
Published: Moscow Pleiades Publishing 01-05-2016
Subjects:
Chemistry
Chemistry and Materials Science
Physical Chemistry
Short Communications Plasma Chemistry
High Energy Chemistry
Ethylsilane
Plasma Chemistry Plasma
Monosilane
Deposition Temperature
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Description
ISSN:0018-1439
1608-3148
DOI:10.1134/S0018143916030085