Diffusion of reactive ion beam etched polymers

Diffusion of reactive ion beam etched polymers

The diffusion of deuterated polystyrene (d-PS) in a polystyrene matrix was used to probe the damage to the polymer surface caused by reactive ion beam etching (RIBE). Diffusion was seen to be hindered in a d-PS film treated by RIBE, an immobilization apparently due to crosslinking of the surface mon...

Full description

Saved in:
Bibliographic Details
Published in:Applied physics letters Vol. 52; no. 2; pp. 101 - 102
Main Authors: TEAD, S. F, VANDERLINDE, W. E, RUOFF, A. L, KRAMER, E. J
Format: Journal Article
Language:English
Published: Melville, NY American Institute of Physics 11-01-1988
Subjects:
Applied sciences
Exact sciences and technology
Miscellaneous
Organic polymers
Physicochemistry of polymers
Properties and characterization
Thickness
Reactive ion etching
Labelled polymer
Crosslinking
Styrene polymer
Diffusion
Bilayer
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:The diffusion of deuterated polystyrene (d-PS) in a polystyrene matrix was used to probe the damage to the polymer surface caused by reactive ion beam etching (RIBE). Diffusion was seen to be hindered in a d-PS film treated by RIBE, an immobilization apparently due to crosslinking of the surface monolayer of the polymer sample.
Bibliography:ObjectType-Article-2
SourceType-Scholarly Journals-1
ObjectType-Feature-1
content type line 23
ISSN:0003-6951
1077-3118
DOI:10.1063/1.99062