Effect of growth parameters on TiO2 thin films deposited using MOCVD

Effect of growth parameters on TiO2 thin films deposited using MOCVD

Saved in:
Bibliographic Details
Published in:Journal of crystal growth Vol. 179; no. 3-4; pp. 522 - 538
Main Authors: NAMI, Z, MISMAN, O, ERBIL, A, MAY, G. S
Format: Journal Article
Language:English
Published: Amsterdam Elsevier 01-08-1997
Subjects:
Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.)
Cross-disciplinary physics: materials science; rheology
Exact sciences and technology
Materials science
Methods of deposition of films and coatings; film growth and epitaxy
Physics
Thin films
Titanium oxides
Inorganic compounds
Transition element compounds
Growth mechanism
Theoretical study
Binary compounds
Numerical simulation
Crystal growth from vapors
Experimental study
MOCVD
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
ISSN:0022-0248
1873-5002
DOI:10.1016/S0022-0248(97)00144-9