Physical Properties of a Low-Power Helicon Source Operating on a High-Frequency Discharge with a Capacitive Component

• Published in: Plasma physics reports Vol. 49; no. 7; pp. 890 - 900
• Main Authors: Zadiriev, I. I., Vavilin, K. V., Kral’kina, E. A., Nikonov, A. M., Shvydkii, G. V.
• Format: Journal Article
• Language: English
• Published: Moscow Pleiades Publishing 01-07-2023; Springer Nature B.V
• Subjects: Atomic; Electron flux; Ion and Plasma Sources; Magnetic fields; Magnetic induction; Molecular; Optical and Plasma Physics; Physical properties; Physics; Physics and Astronomy; Radio frequency discharge; inductive; hybrid; capacitive; helicon plasma source; radio-frequency discharge
• ISSN: 1063-780X; 1562-6938
• DOI: 10.1134/S1063780X23600536

The results of an experimental study of a low-power RF plasma source placed in a longitudinal magnetic field (helicon thruster), when it operates on a capacitive RF discharge and inductive RF discharges with a capacitive component, are presented. A significant dependence of the characteristics of the ion and electron fluxes of the source on the induction of a constant magnetic field is shown. The fundamental applicability of capacitive RF discharge as a working process in the studied plasma source is demonstrated. It is shown that the increase in the average energy of ions in the flow at the outlet of the source with the appearance of the capacitive component of the discharge is slight.