Core-shell building blocks of nanosized Beeswax-Cu2O composites with multifunction of Antibiotic, anti-biofilm and self-cleaning

[Display omitted] The beeswax- and CTAB-assisted synthesis of cubic-shaped Cu2O nanostructures is successfully achieved as a self-cleaning material in the form of suspension with an average particle size of about 200 nm to clean surfaces that may expose bacteria and complex biofilms accompanied with...

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Bibliographic Details
Published in:Journal of photochemistry and photobiology. A, Chemistry. Vol. 452; p. 115540
Main Authors: Nguyen, Tiep Khac, D.Kieu, Anh, Tran, Minh Duc, Tran, Thi Thuong Huyen, Sai, Cong Doanh, Tran, Duc Trong, Dang, Diep Ngoc, Pham, Son Anh, Do, Huy-Hoang
Format: Journal Article
Language:English
Published: Elsevier B.V 01-07-2024
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Summary:[Display omitted] The beeswax- and CTAB-assisted synthesis of cubic-shaped Cu2O nanostructures is successfully achieved as a self-cleaning material in the form of suspension with an average particle size of about 200 nm to clean surfaces that may expose bacteria and complex biofilms accompanied with absorbed antibiotics compounds. This unique material with a distinct cubic morphology of the beeswax shell and well-defined cubic Cu2O core is clearly observed in the core–shell structure. The Cu2O/beeswax/CTAB materials exhibit vigorous antimicrobial activity against common strains of bacteria and fungi such as E. coli, S. aureus, and C. albicans. The material effectively kills bacteria existing in the bacterial biofilms after just one spraying of the Cu2O/beeswax/CTAB suspension. Interestingly, the 40 %Cu2O/beeswax/CTAB sample is highly active and stable for the photocatalytic degradation of the dye methylene blue as an antibiotic model. Under visible light, the degradation yielded up to 82 % with the presence of 0.3 % H2O2 at room temperature. In addition the layer coater surface inhibits surface hydrophilicity and the microorganism for more than 72 h and also decolors newly absorbed methylene blue up to 64 % yield, even after three times recycling.
ISSN:1010-6030
1873-2666
DOI:10.1016/j.jphotochem.2024.115540