AFM imaging and fractal analysis of surface roughness of AlN epilayers on sapphire substrates

• Published in: Applied surface science Vol. 312; pp. 81 - 86
• Main Authors: DALLAEVA, Dinara, TALU, Ştefan, STACH, Sebastian, SKARVADA, Pavel, TOMANEK, Pavel, GRMELA, Lubomír
• Format: Journal Article
• Language: English
• Published: Amsterdam Elsevier 01-09-2014
• Subjects: Aluminum nitride; Atomic force microscopy; Condensed matter: electronic structure, electrical, magnetic, and optical properties; Condensed matter: structure, mechanical and thermal properties; Cross-disciplinary physics: materials science; rheology; Exact sciences and technology; Fractal analysis; Imaging; Morphology; Physics; Sapphire; Surface roughness; Three dimensional; Atomic force microscopy; Inorganic compounds; Semiconductor materials; Epitaxy; Fractal analysis; Aluminium nitride; Roughness; Aluminium; Fractals; Surface roughness; Surface analysis; Substrate; Imaging; Aluminum nitride
• ISSN: 0169-4332; 1873-5584
• DOI: 10.1016/j.apsusc.2014.05.086

The paper deals with AFM imaging and characterization of 3D surface morphology of aluminum nitride (AlN) epilayers on sapphire substrates prepared by magnetron sputtering. Due to the effect of temperature changes on epilayer's surface during the fabrication, a surface morphology is studied by combination of atomic force microscopy (AFM) and fractal analysis methods. Both methods are useful tools that may assist manufacturers in developing and fabricating AlN thin films with optimal surface characteristics. Furthermore, they provide different yet complementary information to that offered by traditional surface statistical parameters. This combination is used for the first time for measurement on AlN epilayers on sapphire substrates, and provides the overall 3D morphology of the sample surfaces (by AFM imaging), and reveals fractal characteristics in the surface morphology (fractal analysis).