Chemical vapor deposition of refractory metals from fluoride gases

The kinetics of the chemical vapor deposition of Group V (V, Nb, Ta), VI (Mo, W), and VII (Re) transition metals from fluoride-hydrogen mixtures were studied. The major steps of the deposition process were established. The deposition rate is shown to correlate with the thermodynamic probability of h...

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Bibliographic Details

Published in:	Inorganic materials Vol. 36; no. 5; pp. 454 - 457
Main Authors:	Lakhotkin, Yu. V., Kuz’min, V. P., Rybkina, T. I., Kovalev, A. B.
Format:	Journal Article
Language:	English
Published:	New York Springer Nature B.V 01-05-2000
Subjects:	Chemical vapor deposition Hydrogen reduction Molybdenum Refractory metals Transition metals
Online Access:	Get full text
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