Dopant boron concentration dependence on electron irradiation enhanced defects in Czochralski silicon
Positron annihilation lifetime experiments have been performed for CZ-Si with B concentration ranging over 8.3×10 17–2.5×10 20/cm 3 irradiated with 6 MeV electrons at room temperature. The mean lifetimes were hardly changed in the specimens with B below 8.0×10 18/cm 3, and increased in the specimen...
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Published in: | Physica. B, Condensed matter Vol. 308; pp. 261 - 264 |
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Main Authors: | , , , , |
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Language: | English |
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Elsevier B.V
01-12-2001
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Abstract | Positron annihilation lifetime experiments have been performed for CZ-Si with B concentration ranging over 8.3×10
17–2.5×10
20/cm
3 irradiated with 6
MeV electrons at room temperature. The mean lifetimes were hardly changed in the specimens with B below 8.0×10
18/cm
3, and increased in the specimen above 8.6×10
19/cm
3 by irradiation. No remarkable lifetime change with B concentration was obtained with the increase of electron fluence up to 5×10
15
e/cm
2, and the mean lifetimes of the specimens with B more than 8.6×10
19/cm
3 increased with electron fluences higher than 1×10
16
e/cm
2. It is concluded that complex defect clusters of B
x
O
y
V
z
are formed by electron irradiation, which have shorter positron lifetimes than the bulk. |
---|---|
AbstractList | Positron annihilation lifetime experiments have been performed for CZ-Si with B concentration ranging over 8.3×10
17–2.5×10
20/cm
3 irradiated with 6
MeV electrons at room temperature. The mean lifetimes were hardly changed in the specimens with B below 8.0×10
18/cm
3, and increased in the specimen above 8.6×10
19/cm
3 by irradiation. No remarkable lifetime change with B concentration was obtained with the increase of electron fluence up to 5×10
15
e/cm
2, and the mean lifetimes of the specimens with B more than 8.6×10
19/cm
3 increased with electron fluences higher than 1×10
16
e/cm
2. It is concluded that complex defect clusters of B
x
O
y
V
z
are formed by electron irradiation, which have shorter positron lifetimes than the bulk. |
Author | Tamano, T. Oshima, R. Hori, F. Hoshikawa, K. Taniguchi, R. |
Author_xml | – sequence: 1 givenname: T. surname: Tamano fullname: Tamano, T. email: tamano@mtl.osakafu-u.ac.jp organization: Department of Material Engineering, Osaka Prefecture University, 1-1, Gakuen-cho, Sakai, Osaka 599-8531, Japan – sequence: 2 givenname: F. surname: Hori fullname: Hori, F. organization: Research Institute for Advanced Science and Technology, Osaka Prefecture University, 1-2, Gakuen-cho, Sakai, Osaka 599-8570, Japan – sequence: 3 givenname: R. surname: Taniguchi fullname: Taniguchi, R. organization: Research Institute for Advanced Science and Technology, Osaka Prefecture University, 1-2, Gakuen-cho, Sakai, Osaka 599-8570, Japan – sequence: 4 givenname: R. surname: Oshima fullname: Oshima, R. organization: Research Institute for Advanced Science and Technology, Osaka Prefecture University, 1-2, Gakuen-cho, Sakai, Osaka 599-8570, Japan – sequence: 5 givenname: K. surname: Hoshikawa fullname: Hoshikawa, K. organization: Department of Education, Shinsyu University, 6-kuthi Nishi-Nagano, Nagano, Nagano 380-8544, Japan |
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Cites_doi | 10.1103/PhysRevB.61.8155 10.1016/0010-4655(81)90006-0 10.1103/PhysRevB.14.2709 10.1143/JJAP.38.2679 10.1149/1.2097135 10.1103/PhysRevB.53.7810 10.4028/www.scientific.net/MSF.105-110.1301 10.1143/JJAP.39.4693 10.1143/JJAP.40.452 10.1103/PhysRevLett.67.212 |
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Keywords | Czochralski-grown silicon Positron lifetime Electron irradiation Dopant boron |
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Snippet | Positron annihilation lifetime experiments have been performed for CZ-Si with B concentration ranging over 8.3×10
17–2.5×10
20/cm
3 irradiated with 6
MeV... |
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StartPage | 261 |
SubjectTerms | Czochralski-grown silicon Dopant boron Electron irradiation Positron lifetime |
Title | Dopant boron concentration dependence on electron irradiation enhanced defects in Czochralski silicon |
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