P-111: A Thin Film Encapsulation Stack for PLED and OLED Displays

• Published in: SID International Symposium Digest of technical papers Vol. 35; no. 1; pp. 695 - 697
• Main Authors: Van Assche, F. J. H., Vangheluwe, R. T., Maes, J. W. C., Mischke, W. S., Bijker, M. D., Dings, F. C., Evers, M. F. J., Kessels, W. M. M., Van de Sanden, M. C. M.
• Format: Journal Article
• Language: English
• Published: Oxford, UK Blackwell Publishing Ltd 01-05-2004
• ISSN: 0097-966X; 2168-0159
• DOI: 10.1889/1.1831072

For a thin film (< 1 μm) encapsulation stack consisting of only 3 plasma deposited silicon nitride layers separated by a thin (< 100 nm) organic layer, a water permeation rate of below 10−5 g/m2 per day at 50 °C and 50% rH has been measured using the Ca test. PLED lifetimes of over 500 hours at 60 °C and 90% rH have been reached locally. While the Ca test indicates that pinhole free encapsulation is possible, edge and particle related defects still forecast a challenge for device encapsulation.