Electrical behaviour of yttria-doped zirconia (YSZ) in the metal-insulator-metal thin film structure

The high ionic conductivity of doped ZrO2 at elevated temperatures is exploited for solid electrolyte applications. The conductivity can be higher for the same temperatures if the ZrO2 is prepared in the form of a thin film, and thin film ZrO2 devices can, therefore, be operated at lower temperature...

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Published in:Journal of materials science letters Vol. 12; no. 16; pp. 1306 - 1308
Main Authors: SALY, V, CHROMIK, S
Format: Journal Article
Language:English
Published: Dordrecht Kluwer Academic Publishers 01-01-1993
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Summary:The high ionic conductivity of doped ZrO2 at elevated temperatures is exploited for solid electrolyte applications. The conductivity can be higher for the same temperatures if the ZrO2 is prepared in the form of a thin film, and thin film ZrO2 devices can, therefore, be operated at lower temperatures. Thin film metal-insulator-metal (MIM) structures were prepared by electron beam evaporation using YSZ thin film and Mo metal, and the electrical properties were characterised using the electric modulus formalism method. It was found that the conductance of the Mo-YSZ-Mo structure increases with increasing frequency in the range 10-100000 Hz; the conductance curves are shifted to higher frequencies with increasing temperature. The electric modulus exhibits peaks which appear at higher frequencies as the temperature increases. The frequency dependencies of the real and imaginary parts of the complex dielectric permittivity are shown; the plot is shifted to higher frequencies with increasing temperature. Calculation of activation energies was performed. The frequency dependencies of the complex permittivity parts suggests that in the Mo-YSZ-Mo structure (when YSZ is monoclinic), a "hopping" mechanism of conductivity dominates in the frequency and temperature ranges studied. The concentration of mobile carriers does not change at temperatures in the region 125-225 C. 8 refs.
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ISSN:0261-8028
1573-4811
DOI:10.1007/BF00506346