Microstructural characterization of thin SiOx films obtained by physical vapor deposition

Microstructural characterization of thin SiOx films obtained by physical vapor deposition

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Bibliographic Details
Published in:Materials science & engineering. B, Solid-state materials for advanced technology Vol. 174; no. 1-3; pp. 132 - 136
Main Authors: Curiel, M.A., Nedev, N., Nesheva, D., Soares, J., Haasch, R., Sardela, M., Valdez, B., Sankaran, B., Manolov, E., Bineva, I., Petrov, I.
Format: Journal Article
Language:English
Published: 25-10-2010
Online Access:Get full text
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Description
ISSN:0921-5107
DOI:10.1016/j.mseb.2010.03.007