Planar Dechannelling of Energetic Ions at Dislocations. III. Dechannelling at Edge Dislocations in Si

The planar dechannelling cross-sections of MeV ions at dislocations were calculated and the results were summarized in graphs, from which the dechannelling cross-section at a dislocation in an arbitrary crystal can be derived. The observed planar dechannelling cross-sections at edge dislocations in...

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Bibliographic Details
Published in:Japanese Journal of Applied Physics Vol. 21; no. 12R; p. 1769
Main Authors: Kimura, Kenji, Mannami, Michihiko, Natsuaki, Nobuyoshi
Format: Journal Article
Language:English
Published: 01-12-1982
Online Access:Get full text
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Summary:The planar dechannelling cross-sections of MeV ions at dislocations were calculated and the results were summarized in graphs, from which the dechannelling cross-section at a dislocation in an arbitrary crystal can be derived. The observed planar dechannelling cross-sections at edge dislocations in Si crystals implanted with phosphorus ions were compared with those derived from the calculated graphs, and the agreement between them was found to be satisfactory.
ISSN:0021-4922
1347-4065
DOI:10.1143/JJAP.21.1769