Leveraging Atomistic Modeling during Precursor Design for Cobalt Film Deposition

Atomic Layer Deposition (ALD) is used to fabricate ultrathin and conformal thin film structures for many semiconductor and thin film device applications. ALD is particularly advantageous for integrated circuit manufacturing which requires control of film structure in the nanometer or sub-nanometer s...

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Bibliographic Details

Published in:	Computer Aided Chemical Engineering Vol. 44; pp. 157 - 162
Main Authors:	Adamczyk, Andrew J., Cooper, Alan C., Kim, Moo-Sung, Ivanov, Sergei V.
Format:	Book Chapter
Language:	English
Published:	2018
Subjects:	Computational chemistry Density Functional Theory (DFT) nonlinear eigenvalue problem product design surface reactions Computational chemistry product design surface reactions Density Functional Theory (DFT) nonlinear eigenvalue problem
Online Access:	Get full text
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