Pulsed laser deposition (PLD) of hafnium oxide thin films

• Published in: 2014 16th International Conference on Transparent Optical Networks (ICTON) pp. 1 - 3
• Main Authors: Plociennik, Przemyslaw, Zawadzka, Anna, Strzelecki, Janusz, Lukasiak, Zbigniew, Korcala, Andrzej
• Format: Conference Proceeding
• Language: English
• Published: IEEE 01-07-2014
• Subjects: Hafnium oxide; Laser ablation; Photoluminescence; PLD (Pulsed Laser Deposition); Pulsed laser deposition; Substrates; Temperature measurement; transmission
• ISSN: 2162-7339
• DOI: 10.1109/ICTON.2014.6876620

This work contains the experimental investigation of optical properties of HfO 2 (hafnium oxide) thin films grown on quartz and n-type silica substrates by pulsed laser deposition method. Cold pressed powders of hafnium oxide (HfO 2 98% - Aldrich Chem. Co.) were used as the target for deposition process. The substrates was heated up to temperature in the range between 200 and 500 °C. Optical properties of the films were investigated by transmittance in the ultra-violet, visible and near infrared range and photoluminescence spectroscopy. We measure the photo-luminescence spectra and dynamics of luminescence process. Optical properties are closely related to the structure of the hafnium oxide thin films.