Optimization of light-valve mirrors
— A mirror structure for reflective Si‐based light valves was fabricated using chemical‐mechanical polishing and a thin 150‐nm Al(Cu)/Ti mirror to minimize hillock formation. The use of chemical‐mechanical polishing planarization resulted in only a 1% loss in reflectivity from topography under the m...
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Published in: | Journal of the Society for Information Display Vol. 6; no. 4; pp. 247 - 251 |
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Main Authors: | , , , , , , , , |
Format: | Journal Article Conference Proceeding |
Language: | English |
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Oxford, UK
Blackwell Publishing Ltd
01-12-1998
Society for Information Display |
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Abstract | — A mirror structure for reflective Si‐based light valves was fabricated using chemical‐mechanical polishing and a thin 150‐nm Al(Cu)/Ti mirror to minimize hillock formation. The use of chemical‐mechanical polishing planarization resulted in only a 1% loss in reflectivity from topography under the mirrors. The reflectivity for pixel sizes from 7.5 to 40 μm and 0.7‐ or 0.5‐μ.m gaps were measured, and the performance of TN LC pixels with different sizes and inversion methods are reported. |
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AbstractList | — A mirror structure for reflective Si‐based light valves was fabricated using chemical‐mechanical polishing and a thin 150‐nm Al(Cu)/Ti mirror to minimize hillock formation. The use of chemical‐mechanical polishing planarization resulted in only a 1% loss in reflectivity from topography under the mirrors. The reflectivity for pixel sizes from 7.5 to 40 μm and 0.7‐ or 0.5‐μ.m gaps were measured, and the performance of TN LC pixels with different sizes and inversion methods are reported. Abstract— A mirror structure for reflective Si‐based light valves was fabricated using chemical‐mechanical polishing and a thin 150‐nm Al(Cu)/Ti mirror to minimize hillock formation. The use of chemical‐mechanical polishing planarization resulted in only a 1% loss in reflectivity from topography under the mirrors. The reflectivity for pixel sizes from 7.5 to 40 μm and 0.7‐ or 0.5‐μ.m gaps were measured, and the performance of TN LC pixels with different sizes and inversion methods are reported. |
Author | Colgan, E. G. Yang, K.-H. Doany, F. Uda, M. Tomooka, T. Rosenbluth, A. Shinohara, M. Lu, M. Tsukamoto, T. |
Author_xml | – sequence: 1 givenname: E. G. surname: Colgan fullname: Colgan, E. G. email: ecolgan@us.ibm.com organization: IBM T. J. Watson Research Center, P.O. Box 218, 10-204, Yorktown Heights, NY 10598 – sequence: 2 givenname: F. surname: Doany fullname: Doany, F. organization: IBM T. J. Watson Research Center, P.O. Box 218, 10-204, Yorktown Heights, NY 10598 – sequence: 3 givenname: M. surname: Lu fullname: Lu, M. organization: IBM T. J. Watson Research Center, P.O. Box 218, 10-204, Yorktown Heights, NY 10598 – sequence: 4 givenname: A. surname: Rosenbluth fullname: Rosenbluth, A. organization: IBM T. J. Watson Research Center, P.O. Box 218, 10-204, Yorktown Heights, NY 10598 – sequence: 5 givenname: K.-H. surname: Yang fullname: Yang, K.-H. organization: IBM T. J. Watson Research Center, P.O. Box 218, 10-204, Yorktown Heights, NY 10598 – sequence: 6 givenname: M. surname: Uda fullname: Uda, M. organization: IBM Microelectronics Division, Yasu, Japan – sequence: 7 givenname: M. surname: Shinohara fullname: Shinohara, M. organization: IBM Microelectronics Division, Yasu, Japan – sequence: 8 givenname: T. surname: Tomooka fullname: Tomooka, T. organization: IBM Display Business Unit, Yasu, Japan – sequence: 9 givenname: T. surname: Tsukamoto fullname: Tsukamoto, T. organization: IBM Display Business Unit, Yasu, Japan |
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Cites_doi | 10.1016/0040-6090(92)90539-N 10.1147/rd.423.0347 10.1147/rd.423.0321 |
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Keywords | Reflectivity Optical valve Planarization Reflected light Polishing Experimental study Mirror Pixel |
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References | H. Landis, P. Burke, W. Cote, et al, "Integration of chemical-mechanical polishing into CMOS integrated circuit manufacturing," Thin Solid Films 220, 1 (1992). J. L. Sanford, E. S. Schlig, T. Tomooka, et al, "Silicon light-valve array chip for high-resolution reflective liquid crystal projection displays," IBM J Res Develop 42(3/4), 347-358 (1998). R. L. Melcher, P. M. Alt, D. B. Dove, et al, "Design and fabrication of a prototype projection data monitor with high information content," IBM J Res Develop 42 (3/4), 321-338(1998). J. Bowron and T. Schmidt, "A high resolution reflective light valve projector: ELECTROHOME DLV 1280," in press, SPIE 3296, M. H. Wu editor (1998). A. O'Hara, I. Underwood, and D. G. Vass, "Planarisation of spatial light modulator silicon backplanes using chemical-mechanical polishing," IEE Colloquium on Microengineering and Optics, Digest 1994 043, 5/1-6 (1994). 1998 1997 1994; 1994 1992; 220 1998; 42 1991 e_1_2_1_7_1 e_1_2_1_8_1 e_1_2_1_6_1 e_1_2_1_3_1 e_1_2_1_4_1 O'Hara A. (e_1_2_1_10_1) 1994; 1994 e_1_2_1_2_1 Bowron J. (e_1_2_1_5_1) 1998 e_1_2_1_9_1 |
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Snippet | — A mirror structure for reflective Si‐based light valves was fabricated using chemical‐mechanical polishing and a thin 150‐nm Al(Cu)/Ti mirror to minimize... Abstract— A mirror structure for reflective Si‐based light valves was fabricated using chemical‐mechanical polishing and a thin 150‐nm Al(Cu)/Ti mirror to... |
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SubjectTerms | Applied sciences Display Display devices, liquid-crystal devices Electronics Exact sciences and technology Fundamental areas of phenomenology (including applications) Liquid crystals liquid-crystal light valves Optical elements, devices, and systems Optical materials Optics Physics planarization Reflective light valves |
Title | Optimization of light-valve mirrors |
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