Laser ablated Ni-doped HfO2 thin films: Room temperature ferromagnets

Laser ablated Ni-doped HfO2 thin films: Room temperature ferromagnets

Laser ablated Ni-doped HfO2 thin films fabricated under a wide range of growth conditions all showed ferromagnetism above room temperature. However, the films deposited at 800°C under an oxygen partial pressure of 10−6Torr have the largest magnetic moment of 2.7μB∕Ni. Ni-doped HfO2 films also well d...

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Bibliographic Details
Published in:Applied physics letters Vol. 86; no. 24
Main Authors: Hong, Nguyen Hoa, Sakai, Joe, Poirot, Nathalie, Ruyter, Antoine
Format: Journal Article
Language:English
Published: American Institute of Physics 13-06-2005
Subjects:
Physics
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Summary:Laser ablated Ni-doped HfO2 thin films fabricated under a wide range of growth conditions all showed ferromagnetism above room temperature. However, the films deposited at 800°C under an oxygen partial pressure of 10−6Torr have the largest magnetic moment of 2.7μB∕Ni. Ni-doped HfO2 films also well demonstrate a large anisotropy. Magnetic force microscopy measurements confirmed that Ni-doped HfO2 films are real room temperature ferromagnets with a domain structure, and that the size of magnetic domains is larger than 10μm.
ISSN:0003-6951
1077-3118
DOI:10.1063/1.1949723