Plasma characteristics in Ne/Xe/HCl gas mixtures: A parametric study
An important class of exciplex molecules consists of rare gas halides (RgH) such as the monochloride of xenon (XeCl). This excimer emits photons with energies of about eV at wavelength of 308 nm. The present work examines the effects of external circuit parameters and total gas pressure on the chara...
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Published in: | Materials today : proceedings Vol. 49; pp. 970 - 975 |
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Abstract | An important class of exciplex molecules consists of rare gas halides (RgH) such as the monochloride of xenon (XeCl). This excimer emits photons with energies of about eV at wavelength of 308 nm. The present work examines the effects of external circuit parameters and total gas pressure on the characteristic properties of excimer discharge plasma in Ne/Xe/HCl gas mixture. The numerical investigation is carried using a zero-dimensional model, in which the electric circuit, the kinetic processes in the active medium, and the electron Boltzmann equation are considered. We find that increasing values of capacitance, inductance, charging voltage, and gas pressure affects significantly the discharge plasma behavior. |
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AbstractList | An important class of exciplex molecules consists of rare gas halides (RgH) such as the monochloride of xenon (XeCl). This excimer emits photons with energies of about eV at wavelength of 308 nm. The present work examines the effects of external circuit parameters and total gas pressure on the characteristic properties of excimer discharge plasma in Ne/Xe/HCl gas mixture. The numerical investigation is carried using a zero-dimensional model, in which the electric circuit, the kinetic processes in the active medium, and the electron Boltzmann equation are considered. We find that increasing values of capacitance, inductance, charging voltage, and gas pressure affects significantly the discharge plasma behavior. |
Author | Belasri, Ahmed Harrache, Zahir Amir Aid, Driss Harrache, Yazid |
Author_xml | – sequence: 1 givenname: Zahir orcidid: 0000-0002-3741-5571 surname: Harrache fullname: Harrache, Zahir email: harrache@gmail.com organization: LPPMCA, Faculty of Physics, University of Sciences and Technology of Oran, Oran 31000, Algeria – sequence: 2 givenname: Driss surname: Amir Aid fullname: Amir Aid, Driss organization: LPPMCA, Faculty of Physics, University of Sciences and Technology of Oran, Oran 31000, Algeria – sequence: 3 givenname: Yazid surname: Harrache fullname: Harrache, Yazid organization: LMPA, Department of Physics, University of M’sila, M’sila 28000, Algeria – sequence: 4 givenname: Ahmed surname: Belasri fullname: Belasri, Ahmed organization: LPPMCA, Faculty of Physics, University of Sciences and Technology of Oran, Oran 31000, Algeria |
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Cites_doi | 10.1007/s11090-020-10110-1 10.1088/0022-3727/28/5/006 10.1088/0031-8949/89/8/085603 10.1088/0022-3727/43/13/135202 10.1007/s11090-011-9305-4 10.1134/S1063780X13120015 10.1134/S1063780X13050024 10.1016/j.pquantelec.2012.03.003 10.1533/9781845699819.7.629 10.1088/0022-3727/47/3/034004 10.1063/1.871517 10.1134/S1063780X17080074 10.1080/10420150701776589 10.1063/1.1625374 10.1002/ctpp.201100011 10.1134/S1063780X1109008X 10.1063/1.1288699 10.1070/QE2010v040n01ABEH014165 10.1097/DSS.0000000000000485 10.1007/978-1-4419-8185-1 10.1007/s11090-012-9416-6 |
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Surg. doi: 10.1097/DSS.0000000000000485 contributor: fullname: Beggs – start-page: 665 year: 2010 ident: 10.1016/j.matpr.2021.08.101_b0045 article-title: Simulation on optimizing design of XeCl excimer laser contributor: fullname: Songning – year: 2016 ident: 10.1016/j.matpr.2021.08.101_b0115 doi: 10.1007/978-1-4419-8185-1 contributor: fullname: Capitelli – volume: 33 start-page: 131 issue: 1 year: 2013 ident: 10.1016/j.matpr.2021.08.101_b0085 article-title: Plasma chemical and electrical modeling of a dielectric barrier discharge in Kr-Cl2 gas mixtures publication-title: Plasma Chem. Plasma Process. doi: 10.1007/s11090-012-9416-6 contributor: fullname: Belasri |
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Title | Plasma characteristics in Ne/Xe/HCl gas mixtures: A parametric study |
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