Investigation and Integration of Polycrystalline Silicon/TiN/SiON Gate Stack in Silicon on Thin Buried Oxide Complementary Metal Oxide Semiconductor Field Effect Transistors

Investigation and Integration of Polycrystalline Silicon/TiN/SiON Gate Stack in Silicon on Thin Buried Oxide Complementary Metal Oxide Semiconductor Field Effect Transistors

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Bibliographic Details
Published in:Japanese Journal of Applied Physics Vol. 51; no. 7R; p. 76504
Main Authors: Ishigaki, Takashi, Tsuchiya, Ryuta, Morita, Yusuke, Sugii, Nobuyuki, Kimura, Shinichiro, Iwamatsu, Toshiaki, Oda, Hidekazu, Inoue, Yasuo
Format: Journal Article
Language:English
Japanese
Published: 01-07-2012
Online Access:Get full text
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Description
ISSN:0021-4922
1347-4065
DOI:10.7567/JJAP.51.076504