Characteristics of Seebeck Coefficient in Silicon Nanowires Manufactured by CMOS Compatible Process
Silicon nanowires are patterned down to 30 nm using complementary metal-oxide-semiconductor (CMOS) compatible process. The electrical conductivities of n-/p-leg nanowires are extracted with the variation of width. Using this structure, Seebeck coefficients are measured. The obtained maximum Seebeck...
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Published in: | Nanoscale research letters Vol. 5; no. 10; pp. 1654 - 1657 |
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Main Authors: | , , , , , |
Format: | Journal Article |
Language: | English |
Published: |
United States
New York : Springer-Verlag
18-07-2010
BioMed Central Ltd SpringerOpen |
Subjects: | |
Online Access: | Get full text |
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Summary: | Silicon nanowires are patterned down to 30 nm using complementary metal-oxide-semiconductor (CMOS) compatible process. The electrical conductivities of n-/p-leg nanowires are extracted with the variation of width. Using this structure, Seebeck coefficients are measured. The obtained maximum Seebeck coefficient values are 122 μV/K for p-leg and −94 μV/K for n-leg. The maximum attainable power factor is 0.74 mW/m K² at room temperature. |
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Bibliography: | http://dx.doi.org/10.1007/s11671-010-9690-2 |
ISSN: | 1931-7573 1556-276X 1556-276X |
DOI: | 10.1186/1556-276X-5-1654 |