Characteristics of Seebeck Coefficient in Silicon Nanowires Manufactured by CMOS Compatible Process

Silicon nanowires are patterned down to 30 nm using complementary metal-oxide-semiconductor (CMOS) compatible process. The electrical conductivities of n-/p-leg nanowires are extracted with the variation of width. Using this structure, Seebeck coefficients are measured. The obtained maximum Seebeck...

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Bibliographic Details
Published in:Nanoscale research letters Vol. 5; no. 10; pp. 1654 - 1657
Main Authors: Jang, Moongyu, Park, Youngsam, Jun, Myungsim, Hyun, Younghoon, Choi, Sung-Jin, Zyung, Taehyoung
Format: Journal Article
Language:English
Published: United States New York : Springer-Verlag 18-07-2010
BioMed Central Ltd
SpringerOpen
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Summary:Silicon nanowires are patterned down to 30 nm using complementary metal-oxide-semiconductor (CMOS) compatible process. The electrical conductivities of n-/p-leg nanowires are extracted with the variation of width. Using this structure, Seebeck coefficients are measured. The obtained maximum Seebeck coefficient values are 122 μV/K for p-leg and −94 μV/K for n-leg. The maximum attainable power factor is 0.74 mW/m K² at room temperature.
Bibliography:http://dx.doi.org/10.1007/s11671-010-9690-2
ISSN:1931-7573
1556-276X
1556-276X
DOI:10.1186/1556-276X-5-1654