Highly Sensitive Bulk Silicon Chemical Sensors with Sub‑5 nm Thin Charge Inversion Layers

There is an increasing demand for mass-producible, low-power gas sensors in a wide variety of industrial and consumer applications. Here, we report chemical-sensitive field-effect-transistors (CS-FETs) based on bulk silicon wafers, wherein an electrostatically confined sub-5 nm thin charge inversion...

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Published in:ACS nano Vol. 12; no. 3; pp. 2948 - 2954
Main Authors: Fahad, Hossain M, Gupta, Niharika, Han, Rui, Desai, Sujay B, Javey, Ali
Format: Journal Article
Language:English
Published: United States American Chemical Society 27-03-2018
American Chemical Society (ACS)
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Abstract There is an increasing demand for mass-producible, low-power gas sensors in a wide variety of industrial and consumer applications. Here, we report chemical-sensitive field-effect-transistors (CS-FETs) based on bulk silicon wafers, wherein an electrostatically confined sub-5 nm thin charge inversion layer is modulated by chemical exposure to achieve a high-sensitivity gas-sensing platform. Using hydrogen sensing as a “litmus” test, we demonstrate large sensor responses (>1000%) to 0.5% H2 gas, with fast response (<60 s) and recovery times (<120 s) at room temperature and low power (<50 μW). On the basis of these performance metrics as well as standardized benchmarking, we show that bulk silicon CS-FETs offer similar or better sensing performance compared to emerging nanostructures semiconductors while providing a highly scalable and manufacturable platform.
AbstractList There is an increasing demand for mass-producible, low-power gas sensors in a wide variety of industrial and consumer applications. Here, we report chemical-sensitive field-effect-transistors (CS-FETs) based on bulk silicon wafers, wherein an electrostatically confined sub-5 nm thin charge inversion layer is modulated by chemical exposure to achieve a high-sensitivity gas-sensing platform. Using hydrogen sensing as a "litmus" test, we demonstrate large sensor responses (>1000%) to 0.5% H gas, with fast response (<60 s) and recovery times (<120 s) at room temperature and low power (<50 μW). On the basis of these performance metrics as well as standardized benchmarking, we show that bulk silicon CS-FETs offer similar or better sensing performance compared to emerging nanostructures semiconductors while providing a highly scalable and manufacturable platform.
There is an increasing demand for mass-producible, low-power gas sensors in a wide variety of industrial and consumer applications. Here, we report chemical-sensitive field-effect-transistors (CS-FETs) based on bulk silicon wafers, wherein an electrostatically confined sub-5 nm thin charge inversion layer is modulated by chemical exposure to achieve a high-sensitivity gas-sensing platform. Using hydrogen sensing as a “litmus” test, we demonstrate large sensor responses (>1000%) to 0.5% H2 gas, with fast response (<60 s) and recovery times (<120 s) at room temperature and low power (<50 μW). On the basis of these performance metrics as well as standardized benchmarking, we show that bulk silicon CS-FETs offer similar or better sensing performance compared to emerging nanostructures semiconductors while providing a highly scalable and manufacturable platform.
There is an increasing demand for mass-producible, low-power gas sensors in a wide variety of industrial and consumer applications. In this work, we report chemical-sensitive field-effect-transistors (CS-FETs) based on bulk silicon wafers, wherein an electrostatically confined sub-5 nm thin charge inversion layer is modulated by chemical exposure to achieve a high-sensitivity gas-sensing platform. Using hydrogen sensing as a "litmus" test, we demonstrate large sensor responses (>1000%) to 0.5% H2 gas, with fast response (<60 s) and recovery times (<120 s) at room temperature and low power (<50 μW). On the basis of these performance metrics as well as standardized benchmarking, we show that bulk silicon CS-FETs offer similar or better sensing performance compared to emerging nanostructures semiconductors while providing a highly scalable and manufacturable platform.
Author Gupta, Niharika
Javey, Ali
Fahad, Hossain M
Han, Rui
Desai, Sujay B
AuthorAffiliation Lawrence Berkeley National Laboratory
Electrical Engineering & Computer Sciences
Berkeley Sensor and Actuator Center
University of California
Materials Sciences Division
AuthorAffiliation_xml – name: University of California
– name: Berkeley Sensor and Actuator Center
– name: Lawrence Berkeley National Laboratory
– name: Electrical Engineering & Computer Sciences
– name: Materials Sciences Division
Author_xml – sequence: 1
  givenname: Hossain M
  orcidid: 0000-0002-6758-5432
  surname: Fahad
  fullname: Fahad, Hossain M
  organization: Lawrence Berkeley National Laboratory
– sequence: 2
  givenname: Niharika
  surname: Gupta
  fullname: Gupta, Niharika
  organization: University of California
– sequence: 3
  givenname: Rui
  surname: Han
  fullname: Han, Rui
  organization: University of California
– sequence: 4
  givenname: Sujay B
  surname: Desai
  fullname: Desai, Sujay B
  organization: Lawrence Berkeley National Laboratory
– sequence: 5
  givenname: Ali
  orcidid: 0000-0001-7214-7931
  surname: Javey
  fullname: Javey, Ali
  email: ajavey@berkeley.edu
  organization: Lawrence Berkeley National Laboratory
BackLink https://www.ncbi.nlm.nih.gov/pubmed/29455517$$D View this record in MEDLINE/PubMed
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BookMark eNp1kM1OwzAQhC1URH_gzA1ZXFGK7SR2eoQKaKVKHFokJA6R424al8Sp4qSoN16BV-RJcEnpjdOOtN-MdqePOqY0gNAlJUNKGL2VyhppymGUEBJG5AT16MjnHon4a-eoQ9pFfWvXDhGR4Geoy0ZBGIZU9NDbRK-yfIfnYKyu9RbwfZO_47nOtSoNHmdQaCXz331ZWfyh6wzPm-T78yvEpsCLTO8pWa0AT80WKqudbSZ3Tp2j01TmFi4Oc4BeHh8W44k3e36aju9mngwIrT3OpRSjSCWK-ioBkdBIQspgCcQXRHGpgCWKBD5LaeAHJGCcB34qQsIgYpHwB-i6zS1trWOrdA0qc9cbUHVMueMFddBtC6mqtLaCNN5UupDVLqYk3ncZH7qMD106x1Xr2DRJAcsj_1eeA25awDnjddlUxn35b9wPALOB3Q
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ContentType Journal Article
CorporateAuthor Lawrence Berkeley National Laboratory (LBNL), Berkeley, CA (United States)
CorporateAuthor_xml – name: Lawrence Berkeley National Laboratory (LBNL), Berkeley, CA (United States)
DBID NPM
AAYXX
CITATION
OIOZB
OTOTI
DOI 10.1021/acsnano.8b00580
DatabaseName PubMed
CrossRef
OSTI.GOV - Hybrid
OSTI.GOV
DatabaseTitle PubMed
CrossRef
DatabaseTitleList PubMed


DeliveryMethod fulltext_linktorsrc
Discipline Engineering
EISSN 1936-086X
EndPage 2954
ExternalDocumentID 1642671
10_1021_acsnano_8b00580
29455517
d51988362
Genre Research Support, Non-U.S. Gov't
Journal Article
GroupedDBID -
23M
53G
55A
5GY
7~N
AABXI
ABMVS
ABUCX
ACGFS
ACS
AEESW
AENEX
AFEFF
ALMA_UNASSIGNED_HOLDINGS
AQSVZ
CS3
EBS
ED
ED~
EJD
F5P
GNL
IH9
IHE
JG
JG~
P2P
RNS
ROL
UI2
VF5
VG9
W1F
XKZ
YZZ
---
.K2
4.4
5VS
6J9
AAHBH
ABJNI
ABQRX
ACBEA
ACGFO
ADHLV
AHGAQ
BAANH
CUPRZ
GGK
NPM
AAYXX
CITATION
ABFRP
OIOZB
OTOTI
ID FETCH-LOGICAL-a401t-66aa798cbc13cbe7b18aef2ede0370c6ace2bc0432f14340426643f7502e82873
IEDL.DBID ACS
ISSN 1936-0851
IngestDate Mon Jul 10 02:35:04 EDT 2023
Fri Aug 23 00:25:33 EDT 2024
Sat Sep 28 08:32:09 EDT 2024
Thu Aug 27 13:42:00 EDT 2020
IsDoiOpenAccess true
IsOpenAccess true
IsPeerReviewed true
IsScholarly true
Issue 3
Keywords low power
CMOS gas sensors
CS-FET
tunable sensitivity
electrostatic confinement
charge inversion layer
Language English
LinkModel DirectLink
MergedId FETCHMERGED-LOGICAL-a401t-66aa798cbc13cbe7b18aef2ede0370c6ace2bc0432f14340426643f7502e82873
Notes AC02-05CH11231
USDOE Office of Science (SC), Basic Energy Sciences (BES), Materials Sciences & Engineering Division
ORCID 0000-0001-7214-7931
0000-0002-6758-5432
0000000267585432
0000000172147931
OpenAccessLink https://www.osti.gov/servlets/purl/1642671
PMID 29455517
PageCount 7
ParticipantIDs osti_scitechconnect_1642671
crossref_primary_10_1021_acsnano_8b00580
pubmed_primary_29455517
acs_journals_10_1021_acsnano_8b00580
ProviderPackageCode JG~
55A
AABXI
GNL
VF5
XKZ
7~N
VG9
W1F
ACS
AEESW
AFEFF
ABMVS
ABUCX
IH9
AQSVZ
ED~
UI2
PublicationCentury 2000
PublicationDate 2018-03-27
PublicationDateYYYYMMDD 2018-03-27
PublicationDate_xml – month: 03
  year: 2018
  text: 2018-03-27
  day: 27
PublicationDecade 2010
PublicationPlace United States
PublicationPlace_xml – name: United States
PublicationTitle ACS nano
PublicationTitleAlternate ACS Nano
PublicationYear 2018
Publisher American Chemical Society
American Chemical Society (ACS)
Publisher_xml – name: American Chemical Society
– name: American Chemical Society (ACS)
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– ident: ref24/cit24
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SSID ssj0057876
Score 2.4900525
Snippet There is an increasing demand for mass-producible, low-power gas sensors in a wide variety of industrial and consumer applications. Here, we report...
There is an increasing demand for mass-producible, low-power gas sensors in a wide variety of industrial and consumer applications. In this work, we report...
SourceID osti
crossref
pubmed
acs
SourceType Open Access Repository
Aggregation Database
Index Database
Publisher
StartPage 2948
SubjectTerms charge inversion layer
CMOS gas sensors
CS-FET
electrostatic confinement
INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CHEMISTRY
low power
tunable sensitivity
Title Highly Sensitive Bulk Silicon Chemical Sensors with Sub‑5 nm Thin Charge Inversion Layers
URI http://dx.doi.org/10.1021/acsnano.8b00580
https://www.ncbi.nlm.nih.gov/pubmed/29455517
https://www.osti.gov/servlets/purl/1642671
Volume 12
hasFullText 1
inHoldings 1
isFullTextHit
isPrint
link http://sdu.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwlZ07T8MwEMctKAsMvB-lgDx0gCGQOA87I5RWHRBLQEJiiGzHRoiSoKYd2PgKfEU-CXdpWvFQJZgTWdadff6dz_6bkLZwmeWZDBwu8Qkzqz1HZcp1hIyFVAZipcLLyf2EX9-Jyy7K5JzMqeAz70zqMpd5cSpwwAjIzpcYB05ACuok06CL4y6aFJAhQQaKmKn4_GoAlyFdfluGGgVMpx9cWa0vvbV_9GydrNYQSc8nXt8gCybfJCtfpAW3yD0e4Bi80gQPqGNIoxfjwRNNHgfg-pxOdQKq78WwpLgfSyGKfLy9hzR_pvieJ8Va_IOhqMVR7arRK4mEvk1ue92bTt-pH1JwJKRPIyeKpOSx0Ep7vlaGK09IY5nJjOtzV0dSG6Y0ivNZwKcA0yoAFQswwQwK4vs7pJEXudkj1OgozHyrbQxgYIJYMhuyyERKslhqoZukDWZJ64lQplWNm3lpbau0tlWTHE_Nn75MZDXm_9pC96RABChrq_H8jx6lkOaxiHtNsjvx2qwZFgchYCDf_1tPWmQZGKi6Zsj4AWmMhmNzSBbLbHxUjbBP2WvMkg
link.rule.ids 230,315,782,786,887,2769,27085,27933,27934,56747,56797
linkProvider American Chemical Society
linkToHtml http://sdu.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwlZ07T8MwEMctKAMw8H6U8vDQgSWQuIntjFCoiihdWiQkhsh2HIQoKWragY2vwFfkk3CXpuUlJFjjyLLs8_l3PvtvQqrSZYmIle8IhU-YJcZzdKxdR6pQKm3BV2q8nNzsiPaNPDtHmRx3chcGGpFBTVmexP9QF_CO4Vuq0v6RRLuREKTPBRxQGGGo3pn4XjQ_Ps4jQ5wMMDEV8_lRAa5GJvuyGpX6MKu-4WW-zDSW_9_AFbJUICU9GdvAKpmx6RpZ_CQ0uE5u8ThH75l28Lg6Ojh6Ouo90M59DwwhpRPVgLy8P8go7s5S8ClvL68BTR8pvu5JMTN_Zykqc-R7bLSlkNc3yHXjvFtvOsWzCo6CYGrocK6UCKXRxqsZbYX2pLIJs7F1a8I1XBnLtEGpvgRgyscgC7AlAbRgFuXxa5uklPZTu02oNTyIa4lJQsAE64eKJQHjlmvFQmWkKZMqdEtUTIssyjPezIuKvoqKviqTw8koRE9jkY3ff63gKEXAByhya_A0kBlGEPQxLrwy2RoP3rQaFvoBQKHY-VtLDsh8s3vViloX7csKWQA6yi8gMrFLSsPByO6R2Swe7edG9w5Up9T_
linkToPdf http://sdu.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwnV1LS8QwEA66gujB92NdHzl48FLdZtskPa6ri6KIsAqCh5KkiYhrK3b34M2_4F_0lzjTbRcfCOK1KWGYzEy-yWS-ELIrm8yJRAWeUPiEmTO-pxPd9KSKpNIWYqXG5uSTnri4kUfHSJMTVL0wIEQOM-VFER-9-ilxJcOAfwDfU5Vm-xJtR0KiPhVyEWHK1e70qviLJshHtWTIlQFQjAl9fkyAO5LJv-xItQw86xvELLaa7vz_hFwgcyW0pO2RLSySCZsukdlPhIPL5BavdfRfaA-vrWOgo4fD_gPt3ffBIFJasQcU49lzTvGUlkJseX99C2n6SPGVT4oV-jtLkaGjOGuj5wpx-wq57h5fdU688nkFT0FSNfA4V0pE0mjjt4y2QvtSWcdsYpst0TRcGcu0Qco-B6AqwGQL4IsDiMEs0uS3VkktzVK7Tqg1PExazrgI4IINIsVcyLjlWrFIGWnqZBfUEpfukcdF5Zv5camruNRVnexVKxE_jcg2fv-1gSsVA05AsluDt4LMIIbkj3Hh18naaAHH07AoCAEcio2_SbJDpi-PuvH56cVZg8wASCr6EJnYJLXB89Bukck8GW4XdvcBYWTXgg
openUrl ctx_ver=Z39.88-2004&ctx_enc=info%3Aofi%2Fenc%3AUTF-8&rfr_id=info%3Asid%2Fsummon.serialssolutions.com&rft_val_fmt=info%3Aofi%2Ffmt%3Akev%3Amtx%3Ajournal&rft.genre=article&rft.atitle=Highly+Sensitive+Bulk+Silicon+Chemical+Sensors+with+Sub-5+nm+Thin+Charge+Inversion+Layers&rft.jtitle=ACS+nano&rft.au=Fahad%2C+Hossain+M.&rft.au=Gupta%2C+Niharika&rft.au=Han%2C+Rui&rft.au=Desai%2C+Sujay+B.&rft.date=2018-03-27&rft.pub=American+Chemical+Society+%28ACS%29&rft.issn=1936-0851&rft.eissn=1936-086X&rft.volume=12&rft.issue=3&rft_id=info:doi/10.1021%2Facsnano.8b00580&rft.externalDocID=1642671
thumbnail_l http://covers-cdn.summon.serialssolutions.com/index.aspx?isbn=/lc.gif&issn=1936-0851&client=summon
thumbnail_m http://covers-cdn.summon.serialssolutions.com/index.aspx?isbn=/mc.gif&issn=1936-0851&client=summon
thumbnail_s http://covers-cdn.summon.serialssolutions.com/index.aspx?isbn=/sc.gif&issn=1936-0851&client=summon