Sub-10 nm Scale Nanostructures in Self-Organized Linear Di- and Triblock Copolymers and Miktoarm Star Copolymers Consisting of Maltoheptaose and Polystyrene
The present paper describes the sub-10 nm scale self-assembly of AB-type diblock, ABA-type triblock, and A2B-type miktoarm star copolymers consisting of maltoheptaose (MH: A block) and polystyrene (PS: B block). These block copolymers (BCPs) were synthesized through coupling of end-functionalized MH...
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| Published in: | Macromolecules Vol. 48; no. 5; pp. 1509 - 1517 |
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American Chemical Society
10-03-2015
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| Abstract | The present paper describes the sub-10 nm scale self-assembly of AB-type diblock, ABA-type triblock, and A2B-type miktoarm star copolymers consisting of maltoheptaose (MH: A block) and polystyrene (PS: B block). These block copolymers (BCPs) were synthesized through coupling of end-functionalized MH and PS moieties. Small-angle X-ray scattering and atomic force microscope investigations indicated self-organized cylindrical and lamellar structures in the BCP bulks and thin films with domain spacing (d) ranging from 7.65 to 10.6 nm depending on the volume fraction of MH block (ϕMH), Flory–Huggins interaction parameter (χ), and degree of polymerization (N). The BCP architecture also governed the morphology of the BCPs, e.g. the AB-type diblock copolymer (ϕMH = 0.42), the ABA-type triblock copolymer (ϕMH = 0.40), and the A2B-type miktoarm star copolymer (ϕMH = 0.45) self-organized into cylinder (d = 7.65 nm), lamellar (d = 8.41 nm), and lamellar (d = 9.21 nm) structures, respectively. |
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| AbstractList | The present paper describes the sub-10 nm scale self-assembly of AB-type diblock, ABA-type triblock, and A2B-type miktoarm star copolymers consisting of maltoheptaose (MH: A block) and polystyrene (PS: B block). These block copolymers (BCPs) were synthesized through coupling of end-functionalized MH and PS moieties. Small-angle X-ray scattering and atomic force microscope investigations indicated self-organized cylindrical and lamellar structures in the BCP bulks and thin films with domain spacing (d) ranging from 7.65 to 10.6 nm depending on the volume fraction of MH block (ϕMH), Flory–Huggins interaction parameter (χ), and degree of polymerization (N). The BCP architecture also governed the morphology of the BCPs, e.g. the AB-type diblock copolymer (ϕMH = 0.42), the ABA-type triblock copolymer (ϕMH = 0.40), and the A2B-type miktoarm star copolymer (ϕMH = 0.45) self-organized into cylinder (d = 7.65 nm), lamellar (d = 8.41 nm), and lamellar (d = 9.21 nm) structures, respectively. |
| Author | Isono, Takuya Otsuka, Issei Borsali, Redouane Satoh, Toshifumi Zhang, Yao Rochas, Cyrille Kakuchi, Toyoji |
| AuthorAffiliation | Hokkaido University Division of Biotechnology and Macromolecular Chemistry, Faculty of Engineering Graduate School of Chemical Sciences and Engineering Frontier Chemistry Center |
| AuthorAffiliation_xml | – name: Frontier Chemistry Center – name: – name: Division of Biotechnology and Macromolecular Chemistry, Faculty of Engineering – name: Hokkaido University – name: Graduate School of Chemical Sciences and Engineering |
| Author_xml | – sequence: 1 givenname: Issei surname: Otsuka fullname: Otsuka, Issei – sequence: 2 givenname: Yao surname: Zhang fullname: Zhang, Yao – sequence: 3 givenname: Takuya surname: Isono fullname: Isono, Takuya – sequence: 4 givenname: Cyrille surname: Rochas fullname: Rochas, Cyrille – sequence: 5 givenname: Toyoji surname: Kakuchi fullname: Kakuchi, Toyoji – sequence: 6 givenname: Toshifumi surname: Satoh fullname: Satoh, Toshifumi email: satoh@poly-bm.eng.hokudai.ac.jp – sequence: 7 givenname: Redouane surname: Borsali fullname: Borsali, Redouane email: borsali@cermav.cnrs.fr |
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| Title | Sub-10 nm Scale Nanostructures in Self-Organized Linear Di- and Triblock Copolymers and Miktoarm Star Copolymers Consisting of Maltoheptaose and Polystyrene |
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