Deposition Dynamics of Hydrogenated Silicon Clusters on a Crystalline Silicon Substrate under Typical Plasma Conditions
We have studied the deposition dynamics of hydrogenated silicon clusters on a silicon substrate for various cluster sizes and impact energies. The results show that the interaction processes of silicon nanocrystals with a crystalline silicon substrate strongly depend on the impact energy ranging fro...
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| Published in: | The journal of physical chemistry. A, Molecules, spectroscopy, kinetics, environment, & general theory Vol. 114; no. 9; pp. 3297 - 3305 |
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| Main Authors: | , |
| Format: | Journal Article |
| Language: | English |
| Published: |
United States
American Chemical Society
11-03-2010
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| Online Access: | Get full text |
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| Summary: | We have studied the deposition dynamics of hydrogenated silicon clusters on a silicon substrate for various cluster sizes and impact energies. The results show that the interaction processes of silicon nanocrystals with a crystalline silicon substrate strongly depend on the impact energy ranging from elastic scattering over soft-landing to cluster destruction with penetration of some cluster atoms into the substrate. Under certain conditions, epitaxial-like recrystallization of clusters has been observed after the initial cluster structure was completely lost upon surface impact. The reaction mechanisms as a function of impact energy are in good agreement with recent experimental results. |
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| Bibliography: | ObjectType-Article-1 SourceType-Scholarly Journals-1 ObjectType-Feature-2 content type line 23 |
| ISSN: | 1089-5639 1520-5215 |
| DOI: | 10.1021/jp909446c |