Deposition of Poly(acrylic acid) Films by Electrohydrodynamic Atomization in Postdischarge at Atmospheric Pressure in Air

Deposition of Poly(acrylic acid) Films by Electrohydrodynamic Atomization in Postdischarge at Atmospheric Pressure in Air

Deposition of poly(acrylic acid) films has been carried out in air by electrohydrodynamic atomization in post dielectric barrier discharge at atmospheric pressure. The topmost surface layer of the coatings has been analyzed by X-ray photoelectron spectroscopy, revealing a high level of retention of...

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Bibliographic Details
Published in:Chemistry of materials Vol. 18; no. 25; pp. 5860 - 5863
Main Authors: Tatoulian, M, Arefi-Khonsari, F, Tatoulian, L, Amouroux, J, Borra, J. P
Format: Journal Article
Language:English
Published: American Chemical Society 12-12-2006
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Summary:Deposition of poly(acrylic acid) films has been carried out in air by electrohydrodynamic atomization in post dielectric barrier discharge at atmospheric pressure. The topmost surface layer of the coatings has been analyzed by X-ray photoelectron spectroscopy, revealing a high level of retention of the carboxylic acid functionality, up to 80%. These films are found to exhibit a low water contact angle and a high resistance to washing.
Bibliography:istex:444744021183D2B1BEFF7F1364A9AE71111D063A
ark:/67375/TPS-BDVLC0HV-W
ISSN:0897-4756
1520-5002
DOI:10.1021/cm060066e