Search Results - "van der Zwan, B."

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    Mitigation of surface contamination from resist outgassing in EUV lithography by Mertens, B.M., van der Zwan, B., de Jager, P.W.H., Leenders, M., Werij, H.G.C., Benschop, J.P.H., van Dijsseldonk, A.J.J.

    Published in Microelectronic engineering (01-06-2000)
    “…Contamination of optics and mask is one of the possible show stoppers for Extreme Ultraviolet Lithography. One of the important sources of hydrocarbon…”
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    Journal Article Conference Proceeding
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