Heterojunction bipolar transistors with SiGe base grown by molecular beam epitaxy

High-quality SiGe heterojunction bipolar transistors (HBTs) have been fabricated using material grown by molecular beam epitaxy (MBE). The height of parasitic barriers in the conduction band varied over the wafer, and the influence of these barriers on controller current, early voltage, and cutoff f...

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Bibliographic Details
Published in:IEEE electron device letters Vol. 12; no. 7; pp. 357 - 359
Main Authors: Pruijmboom, A., Slotboom, J.W., Gravesteijn, D.J., Fredriksz, C.W., van Gorkum, A.A., van de Heuvel, R.A., van Rooij-Mulder, J.M.L., Streutker, G., van de Walle, G.F.A.
Format: Journal Article
Language:English
Published: New York, NY IEEE 01-07-1991
Institute of Electrical and Electronics Engineers
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Summary:High-quality SiGe heterojunction bipolar transistors (HBTs) have been fabricated using material grown by molecular beam epitaxy (MBE). The height of parasitic barriers in the conduction band varied over the wafer, and the influence of these barriers on controller current, early voltage, and cutoff frequency were studied by experiments and simulations. Temperature-dependent measurements were performed to study the influence of the barriers on the effective bandgap narrowing in the base and to obtain an expression for the collector-current enhancement. From temperature-dependent measurements, the authors demonstrate that the collector-current enhancement of the HBTs can be described by a single exponential function with a temperature-independent prefactor.< >
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content type line 23
ISSN:0741-3106
1558-0563
DOI:10.1109/55.103606