Heterojunction bipolar transistors with SiGe base grown by molecular beam epitaxy
High-quality SiGe heterojunction bipolar transistors (HBTs) have been fabricated using material grown by molecular beam epitaxy (MBE). The height of parasitic barriers in the conduction band varied over the wafer, and the influence of these barriers on controller current, early voltage, and cutoff f...
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Published in: | IEEE electron device letters Vol. 12; no. 7; pp. 357 - 359 |
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Main Authors: | , , , , , , , , |
Format: | Journal Article |
Language: | English |
Published: |
New York, NY
IEEE
01-07-1991
Institute of Electrical and Electronics Engineers |
Subjects: | |
Online Access: | Get full text |
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Summary: | High-quality SiGe heterojunction bipolar transistors (HBTs) have been fabricated using material grown by molecular beam epitaxy (MBE). The height of parasitic barriers in the conduction band varied over the wafer, and the influence of these barriers on controller current, early voltage, and cutoff frequency were studied by experiments and simulations. Temperature-dependent measurements were performed to study the influence of the barriers on the effective bandgap narrowing in the base and to obtain an expression for the collector-current enhancement. From temperature-dependent measurements, the authors demonstrate that the collector-current enhancement of the HBTs can be described by a single exponential function with a temperature-independent prefactor.< > |
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Bibliography: | ObjectType-Article-2 SourceType-Scholarly Journals-1 ObjectType-Feature-1 content type line 23 |
ISSN: | 0741-3106 1558-0563 |
DOI: | 10.1109/55.103606 |