Direct fabrication of nanowires in an electron microscope

Electron-beam-induced deposition (EBID) is a potentially fast and resistless deposition technique which might overcome the fundamental resolution limits of conventional electron-beam lithography. We advance the understanding of the EBID process by simulating the structure growth. The merit of our mo...

Full description

Saved in:

Bibliographic Details
Published in:	Applied physics letters Vol. 82; no. 20; pp. 3514 - 3516
Main Authors:	Silvis-Cividjian, N., Hagen, C. W., Kruit, P., v.d. Stam, M. A. J., Groen, H. B.
Format:	Journal Article
Language:	English
Published:	19-05-2003
Online Access:	Get full text
Tags:	Add Tag No Tags, Be the first to tag this record!

Description
Summary:	Electron-beam-induced deposition (EBID) is a potentially fast and resistless deposition technique which might overcome the fundamental resolution limits of conventional electron-beam lithography. We advance the understanding of the EBID process by simulating the structure growth. The merit of our model is that it explains the shapes of structures grown by EBID quantitatively. It also predicts the possibility to directly fabricate structures with lateral sizes smaller than 10 nm and points out the ideal conditions to achieve this goal. We verify these predictions by fabricating sub-10-nm lines and dots in a state-of-the-art scanning transmission electron microscope.
ISSN:	0003-6951 1077-3118
DOI:	10.1063/1.1575506