Film thickness by interference pattern and optical characterization of polyaniline by spectroscopic ellipsometry

Interference pattern of measured data (dotted line, arbitrary units), interference orders (black diamonds), and simulated refractive index (grey triangles) fitted to Sellmeier-generated refractive index range (cross hatched curve) for thickness inferring. [Display omitted] •Analysis interference pat...

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Bibliographic Details
Published in:Synthetic metals Vol. 223; pp. 80 - 86
Main Authors: de Lima Filho, Joaquim Brasil, Hidalgo, Ángel Alberto
Format: Journal Article
Language:English
Published: Lausanne Elsevier B.V 01-01-2017
Elsevier BV
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Summary:Interference pattern of measured data (dotted line, arbitrary units), interference orders (black diamonds), and simulated refractive index (grey triangles) fitted to Sellmeier-generated refractive index range (cross hatched curve) for thickness inferring. [Display omitted] •Analysis interference pattern may interest researchers working with data fitting.•Mathematical model polyaniline will be a guide for further researches.•This mathematical model allows more confident data analysis from other techniques. Although Polyaniline (PAni) has been largely studied during several decades, many of its features are still not completely understood. Its optical properties have been widely characterized by simple techniques such as absorbance, transmittance, or reflectance in UV–vis–NIR spectral range, but mathematical model describing its optical properties is still scarce. In this study, spectroscopic ellipsometry was utilized to provide spectral data of PAni thin films. We develop a method for film thickness estimation by analysis of interference pattern and we show a very good-quality fitting to measured data with Tauc–Lorentz model in the spectral range 200–1600nm.
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content type line 23
ISSN:0379-6779
1879-3290
DOI:10.1016/j.synthmet.2016.11.025