Search Results - "Ze-Kai Hsiau"
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Robust, stable, and accurate boundary movement for physical etching and deposition simulation
Published in IEEE transactions on electron devices (01-09-1997)“…The increasing complexity of VLSI device interconnect features and fabrication technologies encountered by semiconductor etching and deposition simulation…”
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Journal Article -
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Heterogeneous process simulation tool integration
Published in IEEE transactions on semiconductor manufacturing (01-02-1996)“…An unified strategy for achieving heterogeneous tool integration within the technology computer-aided design (TCAD) realm is presented. Geometry, grid and…”
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Journal Article -
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Modeling and characterization of three-dimensional effects in physical etching and deposition simulation
Published in 1996 International Conference on Simulation of Semiconductor Processes and Devices. SISPAD '96 (IEEE Cat. No.96TH8095) (1996)“…With the ever decreasing transistor feature sizes, scaling of interconnect has caused many new challenges in fabrication technology. Three-dimensional (3D)…”
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Conference Proceeding -
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Boundary movement in semiconductor etching and deposition simulation
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Dissertation -
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Boundary movement in semiconductor etching and deposition simulation
Published 01-01-1997“…Development of next-generation VLSI with deep sub-micron technologies has drawn a demand for fundamental understanding of wafer fabrication steps and…”
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Dissertation -
6
Gridding techniques for the level set method in semiconductor process and device simulation
Published in SISPAD '97. 1997 International Conference on Simulation of Semiconductor Processes and Devices. Technical Digest (1997)“…Owing to the static and nonconformal mesh it employs, the level-set method for geometry representation offers several attractive alternatives for boundary…”
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Conference Proceeding