Search Results - "Zan, Yude"
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Very low-pressure VLP-CVD growth of high quality γ-Al2O3 films on silicon by multi-step process
Published in Journal of crystal growth (01-03-2002)Get full text
Journal Article -
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The growth and characterization of GaN grown on an Al2O3 coated (0 0 1)Si substrate by metalorganic vapor phase epitaxy
Published in Journal of crystal growth (01-10-1998)Get full text
Journal Article -
3
Comparison of properties of solid phase epitaxial silicon on sapphire films recrystallized by rapid thermal annealing and furnace annealing
Published in Materials science & engineering. B, Solid-state materials for advanced technology (1995)“…Chemically vapour deposited silicon on sapphire (SOS) films 0.25 μm thick were implanted with 28Si + and recrystallized in solid phase by furnace annealing…”
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Journal Article Conference Proceeding -
4
Fabrication of GaN epitaxial films on Al2O3/Si (001) substrates
Published in Science China. Technological sciences (01-04-1998)“…Single crystal GaN films of hexagonal modification have been fabricated on Al2O3/Si (001) substrates via a low pressure metalorganic chemical deposition…”
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Journal Article -
5
Wurtzite GaN epitaxial growth on a Si(001) substrate using γ-Al2O3 as an intermediate layer
Published in Applied physics letters (05-01-1998)“…Wurtzite GaN films have been grown on (001) Si substrates using γ-Al2O3 as an intermediate layer by low pressure (∼76 Torr) metalorganic chemical vapor…”
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Journal Article -
6
Very low-pressure VLP-CVD growth of high quality γ-Al 2O 3 films on silicon by multi-step process
Published in Journal of crystal growth (2002)“…γ-Al 2O 3 films were grown on Si (1 0 0) substrates using the sources of TMA (Al(CH 3) 3) and O 2 by very low-pressure chemical vapor deposition. The effects…”
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Journal Article -
7
The growth and characterization of GaN grown on an Al 2O 3 coated (0 0 1) Si substrate by metalorganic vapor phase epitaxy
Published in Journal of crystal growth (1998)“…Single crystal GaN films have been grown on to an Al 2O 3 coated (0 0 1)Si substrate in a horizontal-type low-pressure MOVPE system. A thin Al 2O 3 layer is an…”
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Journal Article