Search Results - "Zan, Yude"

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    Comparison of properties of solid phase epitaxial silicon on sapphire films recrystallized by rapid thermal annealing and furnace annealing by Wang, Qiyuan, Zan, Yude, Wang, Jianhua, Yu, Yuanhuan

    “…Chemically vapour deposited silicon on sapphire (SOS) films 0.25 μm thick were implanted with 28Si + and recrystallized in solid phase by furnace annealing…”
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    Journal Article Conference Proceeding
  4. 4

    Fabrication of GaN epitaxial films on Al2O3/Si (001) substrates by Wang Lianshan, Liu, Xianglin, Yude, Zan, Wang, Du, Wang, Jun, Lu Dacheng, Wang, Zhanguo

    Published in Science China. Technological sciences (01-04-1998)
    “…Single crystal GaN films of hexagonal modification have been fabricated on Al2O3/Si (001) substrates via a low pressure metalorganic chemical deposition…”
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    Journal Article
  5. 5

    Wurtzite GaN epitaxial growth on a Si(001) substrate using γ-Al2O3 as an intermediate layer by Wang, Lianshan, Liu, Xianglin, Zan, Yude, Wang, Jun, Wang, Du, Lu, Da-cheng, Wang, Zhanguo

    Published in Applied physics letters (05-01-1998)
    “…Wurtzite GaN films have been grown on (001) Si substrates using γ-Al2O3 as an intermediate layer by low pressure (∼76 Torr) metalorganic chemical vapor…”
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    Journal Article
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    Very low-pressure VLP-CVD growth of high quality γ-Al 2O 3 films on silicon by multi-step process by Tan, Liwen, Zan, Yude, Wang, Jun, Wang, Qiyuan, Yu, Yuanhuan, Wang, Shurui, Liu, Zhongli, Lin, Lanying

    Published in Journal of crystal growth (2002)
    “…γ-Al 2O 3 films were grown on Si (1 0 0) substrates using the sources of TMA (Al(CH 3) 3) and O 2 by very low-pressure chemical vapor deposition. The effects…”
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    Journal Article
  7. 7

    The growth and characterization of GaN grown on an Al 2O 3 coated (0 0 1) Si substrate by metalorganic vapor phase epitaxy by Wang, Lianshan, Liu, Xianglin, Zan, Yude, Wang, Du, Lu, Da-Cheng, Wang, Zhanguo, Wang, Yutian, Cheng, Lisen, Zhang, Ze

    Published in Journal of crystal growth (1998)
    “…Single crystal GaN films have been grown on to an Al 2O 3 coated (0 0 1)Si substrate in a horizontal-type low-pressure MOVPE system. A thin Al 2O 3 layer is an…”
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    Journal Article