Search Results - "Yum, Jung Hwan"
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Synthesis of Honeycomb‐Structured Beryllium Oxide via Graphene Liquid Cells
Published in Angewandte Chemie (International ed.) (01-09-2020)“…Using high‐resolution transmission electron microscopy and electron energy‐loss spectroscopy, we show that beryllium oxide crystallizes in the planar hexagonal…”
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2
Advanced Silicon-on-Insulator: Crystalline Silicon on Atomic Layer Deposited Beryllium Oxide
Published in Scientific reports (16-10-2017)“…Silicon-on-insulator (SOI) technology improves the performance of devices by reducing parasitic capacitance. Devices based on SOI or silicon-on-sapphire…”
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3
Effects of barrier layers on device performance of high mobility In0.7Ga0.3As metal-oxide-semiconductor field-effect-transistors
Published in Applied physics letters (08-03-2010)“…We have applied single InP barrier layer with different thicknesses and InP/In0.52Al0.48As double-barrier layer to In0.7Ga0.3As Al2O3 metal-oxide-semiconductor…”
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4
Effects of gate-first and gate-last process on interface quality of In0.53Ga0.47As metal-oxide-semiconductor capacitors using atomic-layer-deposited Al2O3 and HfO2 oxides
Published in Applied physics letters (21-12-2009)“…We have investigated the effects of gate-first and gate-last process on oxide/InGaAs interface quality using In0.53Ga0.47As metal-oxide-semiconductor…”
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5
Improved electrical characteristics of TaN/Al2O3/In0.53Ga0.47As metal-oxide-semiconductor field-effect transistors by fluorine incorporation
Published in Applied physics letters (06-07-2009)“…In this work, a postgate CF4 plasma treatment has been demonstrated on In0.53Ga0.47As channel metal-oxide-semiconductor field-effect transistors. Fluorine (F)…”
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6
Epitaxial ALD BeO: Efficient Oxygen Diffusion Barrier for EOT Scaling and Reliability Improvement
Published in IEEE transactions on electron devices (01-12-2011)“…In a previous study, we demonstrated that the BeO film grown by atomic layer deposition (ALD) on Si and III-V metal-oxide-semiconductor devices has excellent…”
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7
Chemical Imprinting of Crystalline Silicon with Catalytic Metal Stamp in Etch Bath
Published in ACS nano (23-01-2018)“…Conventional lithography using photons and electrons continues to evolve to scale down three-dimensional nanoscale patterns, but the complexity of technology…”
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8
Crystalline beryllium oxide on Si (100) deposited using E-beam evaporator and thermal oxidation
Published in Applied surface science (15-06-2019)“…The growth characteristics and electrical properties of thin films of crystalline beryllium oxide (BeO) on Si (100) substrates grown using electron beam…”
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9
Improved dielectric properties of BeO thin films grown by plasma enhanced atomic layer deposition
Published in Solid-state electronics (01-01-2020)“…•Beryllium oxide (BeO) thin films were grown by plasma enhanced atomic layer deposition (PEALD).•Growth rate of PEALD BeO (1.1 Å/cycle) is higher, showing…”
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10
Band alignment of BeO gate dielectric grown by atomic-layer deposition on AlGaN/GaN HEMTs
Published in Applied surface science (01-03-2020)“…•Bandgap of the ALD-BeO film is measured to be 8.2 ± 0.05 eV by REELS.•Valence band offset of the BeO/AlGaN interfaces is determined to be 1.1 ± 0.1 eV by…”
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11
Atomic-layer deposition of crystalline BeO on SiC
Published in Applied surface science (01-03-2019)“…•Single-crystalline BeO films are epitaxially grown on 4H-SiC substrates by ALD.•Domain structures of BeO/4H-SiC (8/7 and 9/8) have residual mismatches of…”
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12
Polarization modulation effect of BeO on AlGaN/GaN high-electron-mobility transistors
Published in Applied physics letters (02-09-2019)“…We investigate the polarization modulation effect of a single-crystalline BeO layer on AlGaN/GaN high-electron-mobility transistors (HEMTs). The BeO layer with…”
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13
Atomic-Layer Deposition of Single-Crystalline BeO Epitaxially Grown on GaN Substrates
Published in ACS applied materials & interfaces (06-12-2017)“…We have grown a single-crystal beryllium oxide (BeO) thin film on a gallium nitride (GaN) substrate by atomic-layer deposition (ALD) for the first time. BeO…”
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14
Domain epitaxy of crystalline BeO films on GaN and ZnO substrates
Published in Journal of the American Ceramic Society (01-06-2019)“…We demonstrated the growth of wurtzite‐crystalline beryllium oxide (BeO) thin films on GaN and ZnO substrates using atomic layer deposition (ALD)…”
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15
Growth and Characterization of BeO Thin Films Grown by Atomic Layer Deposition Using H2O and O3 as Oxygen Sources
Published in Journal of physical chemistry. C (17-08-2017)“…Growth characteristics and properties of BeO films grown by atomic layer deposition (ALD) are investigated. ALD chemistries between dimethylberyllium and two…”
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Growth and Characterization of BeO Thin Films Grown by Atomic Layer Deposition Using H 2 O and O 3 as Oxygen Sources
Published in Journal of physical chemistry. C (17-08-2017)Get full text
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17
Metal-oxide-semiconductor field-effect-transistors on indium phosphide using HfO2 and silicon passivation layer with equivalent oxide thickness of 18 Å
Published in Applied physics letters (25-05-2009)“…In this letter, we demonstrate the electrical properties of metal-oxide-semiconductor capacitors and metal-oxide-semiconductor field-effect transistors…”
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18
Crystalline BeO Grown on 4H-SiC via Atomic Layer Deposition: Band Alignment and Interface Defects
Published in ACS applied electronic materials (23-04-2019)“…A crystalline beryllium oxide (BeO) film was grown on 4H-silicon carbide (4H-SiC) via thermal atomic layer deposition (ALD). Diethylberyllium and water were…”
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19
Synthesis of Honeycomb‐Structured Beryllium Oxide via Graphene Liquid Cells
Published in Angewandte Chemie (01-09-2020)“…Using high‐resolution transmission electron microscopy and electron energy‐loss spectroscopy, we show that beryllium oxide crystallizes in the planar hexagonal…”
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Journal Article -
20
Gate-first inversion-type InP metal-oxide-semiconductor field-effect transistors with atomic-layer-deposited Al2O3 gate dielectric
Published in Applied physics letters (09-06-2008)“…We present n-channel enhancement-mode inversion-type indium phosphide (InP) metal-oxide-semiconductor field-effect transistors with atomic-layer-deposited…”
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