Search Results - "Yukimori, Daiki"

In Situ Generation of Silylzinc by Si−B Bond Activation Enabling Silylzincation and Silaboration of Terminal Alkynes by Nagashima, Yuki, Yukimori, Daiki, Wang, Chao, Uchiyama, Masanobu

“…A new protocol has been designed for the in situ generation of unstable Si−Zn species through the reaction of dialkylzinc, phosphine, and silylborane (Si−B)…”
Get full text

Dearomative triple elementalization of quinolines driven by visible light by Ishigaki, Shiho, Nagashima, Yuki, Yukimori, Daiki, Tanaka, Jin, Matsumoto, Takashi, Miyamoto, Kazunori, Uchiyama, Masanobu, Tanaka, Ken

“…Organoboron and organosilicon compounds are used not only as synthetic building blocks but also as functional materials and pharmaceuticals, and compounds with…”
Get full text

In Situ Generation of Silylzinc by Si−B Bond Activation Enabling Silylzincation and Silaboration of Terminal Alkynes by Nagashima, Yuki, Yukimori, Daiki, Wang, Chao, Uchiyama, Masanobu

“…A new protocol has been designed for the in situ generation of unstable Si−Zn species through the reaction of dialkylzinc, phosphine, and silylborane (Si−B)…”
Get full text

Quadruple Borylation of Terminal Alkynes by Yukimori, Daiki, Nagashima, Yuki, Wang, Chao, Muranaka, Atsuya, Uchiyama, Masanobu

“…We present the first quadruple borylation reaction of terminal alkynes, affording functionalized 1,1,2,2-tetrakis­(boronate) derivatives in a…”
Get full text

Swelling Analysis of Negative-tone Photosensitive Dielectric Materials for Fine Pitch Redistribution Layers by Yukimori, Daiki, Inoue, Go, Ishikawa, Nobuhiro, Sekiguchi, Atsushi, Ogata, Toshiyuki

“…In this study, we investigated the impact of the molecular weight of the base polymers of negative-tone photosensitive dielectric materials (PSDMs) for fine…”
Get full text

Study of i-Line Photosensitive Materials with a Wide Depth of Focus for Fine Pitch Redistribution Layers by Yukimori, Daiki, Kunito, Mei, Ishikawa, Nobuhiro, Sekiguchi, Atsushi, Ogata, Toshiyuki

“…In this study, we investigated the design of photosensitive materials with a wide depth of focus (DOF) for use in fine pitch redistribution layers. First, we…”
Get full text

Lithographic Performance and Insulation Reliability of a Novel i-Line Photosensitive Dielectric Material by Inoue, Go, Yukimori, Daiki, Shibasaki, Kaho, Okuda, Ayano, Ishikawa, Nobuhiro, Han, Young-Gun, Kanayama, Taka, Suetsugu, Tadashi, Ogata, Toshiyuki

“…In this study, we developed a novel negative-tone i-line photosensitive dielectric material (PSDM) with fine resolution and high insulation reliability. We…”
Get full text