Search Results - "Yoo, Sijung"

Refine Results
  1. 1

    An analytical interpretation of the memory window in ferroelectric field-effect transistors by Yoo, Sijung, Choe, Duk-Hyun, Lee, Hyun Jae, Jo, Sanghyun, Lee, Yun Sung, Park, Yoonsang, Kim, Ki-Hong, Kim, Donghoon, Nam, Seung-Geol

    Published in Applied physics letters (27-11-2023)
    “…In this study, we present an analytical equation for describing the memory window of ferroelectric field-effect transistors (FeFETs). The analytical equation…”
    Get full text
    Journal Article
  2. 2

    Fermi-level unpinning in Pt/Al2O3/GaSb PMOS capacitors by sulphurization and rapid thermal annealing of GaSb surfaces by Kim, Seongkyung, Yoo, Sijung, Lim, Hajin, Kim, Joon-Rae, Jeong, Jae Kyeong, Kim, Hyeong Joon

    Published in Applied physics letters (15-08-2016)
    “…A facile route to mitigate the Fermi-level pinning between a p-type GaSb semiconductor and an Al2O3 dielectric is proposed. Combination of the sulphurization…”
    Get full text
    Journal Article
  3. 3

    Resistance switching behavior of atomic layer deposited SrTiO3 film through possible formation of Sr2Ti6O13 or Sr1Ti11O20 phases by Lee, Woongkyu, Yoo, Sijung, Yoon, Kyung Jean, Yeu, In Won, Chang, Hye Jung, Choi, Jung-Hae, Hoffmann-Eifert, Susanne, Waser, Rainer, Hwang, Cheol Seong

    Published in Scientific reports (02-02-2016)
    “…Identification of microstructural evolution of nanoscale conducting phase, such as conducting filament (CF), in many resistance switching (RS) devices is a…”
    Get full text
    Journal Article
  4. 4

    Nociceptive Memristor by Kim, Yumin, Kwon, Young Jae, Kwon, Dae Eun, Yoon, Kyung Jean, Yoon, Jung Ho, Yoo, Sijung, Kim, Hae Jin, Park, Tae Hyung, Han, Jin‐Woo, Kim, Kyung Min, Hwang, Cheol Seong

    Published in Advanced materials (Weinheim) (22-02-2018)
    “…The biomimetic characteristics of the memristor as an electronic synapse and neuron have inspired the advent of new information technology in the neuromorphic…”
    Get full text
    Journal Article
  5. 5

    Understanding the Coexistence of Two Bipolar Resistive Switching Modes with Opposite Polarity in Pt/TiO2/Ti/Pt Nanosized ReRAM Devices by Zhang, Hehe, Yoo, Sijung, Menzel, Stephan, Funck, Carsten, Cüppers, Felix, Wouters, Dirk J, Hwang, Cheol Seong, Waser, Rainer, Hoffmann-Eifert, Susanne

    Published in ACS applied materials & interfaces (05-09-2018)
    “…Redox-type resistive random access memories based on transition-metal oxides are studied as adjustable two-terminal devices for integrated network applications…”
    Get full text
    Journal Article
  6. 6

    Electro-Thermal Model for Thermal Disturbance in Cross-Point Phase-Change Memory by Yoo, Sijung, Lee, Hyung Dong, Lee, Seungyun, Choi, Hyejung, Kim, Taehoon

    Published in IEEE transactions on electron devices (01-04-2020)
    “…We developed an electro-thermal model for cross-point phase-change memory (X-PCM) and compared the calculation values with the experimental results. In order…”
    Get full text
    Journal Article
  7. 7

    Multicolor Changeable Optical Coating by Adopting Multiple Layers of Ultrathin Phase Change Material Film by Yoo, Sijung, Gwon, Taehong, Eom, Taeyong, Kim, Sanggyun, Hwang, Cheol Seong

    Published in ACS photonics (20-07-2016)
    “…The multilayered optical coating whose structure consists of optical cavity and multiple layers of ultrathin phase change material (PCM) film is presented. The…”
    Get full text
    Journal Article
  8. 8

    Influence of the Kinetic Adsorption Process on the Atomic Layer Deposition Process of (GeTe2)(1–x)(Sb2Te3) x Layers Using Ge4+–Alkoxide Precursors by Eom, Taeyong, Gwon, Taehong, Yoo, Sijung, Choi, Byung Joon, Kim, Moo-Sung, Buchanan, Iain, Xiao, Manchao, Hwang, Cheol Seong

    Published in Chemistry of materials (25-02-2014)
    “…(GeTe2)(1–x)(Sb2Te3) x (GST) layers were deposited via atomic layer deposition (ALD) at growth temperatures ranging from 50 to 120 °C using Ge(OCH3)4 or…”
    Get full text
    Journal Article
  9. 9

    Laminated Ferroelectric FET With Large Memory Window and High Reliability by Lee, Hyun Jae, Nam, Seunggeol, Lee, Yunseong, Kim, Kihong, Choe, Duk-Hyun, Yoo, Sijung, Park, Yoonsang, Jo, Sanghyun, Kim, Donghoon, Heo, Jinseong

    Published in IEEE transactions on electron devices (01-04-2024)
    “…In this work, we report a planar Si-based ferroelectric field-effect transistor (FEFET) characterized by a high memory window (MW) of 4.79 V, ten-year…”
    Get full text
    Journal Article
  10. 10

    Atomic Layer Deposition of GeTe and Ge–Sb–Te Films Using HGeCl3, Sb(OC2H5)3, and {(CH3)3Si}2Te and Their Reaction Mechanisms by Gwon, Taehong, Eom, Taeyong, Yoo, Sijung, Yoo, Chanyoung, Park, Eui-sang, Kim, Sanggyun, Kim, Moo-Sung, Buchanan, Iain, Xiao, Manchao, Ivanov, Sergei, Hwang, Cheol Seong

    Published in Chemistry of materials (10-10-2017)
    “…In this paper, a new atomic layer deposition (ALD) process for depositing binary GeTe and ternary Ge–Sb–Te thin films is reported, where HGeCl3 and…”
    Get full text
    Journal Article
  11. 11

    Atomic Layer Deposition of GeTe Films Using Ge{N[Si(CH3)3]2}2, {(CH3)3Si}2Te, and Methanol by Gwon, Taehong, Eom, Taeyong, Yoo, Sijung, Lee, Han-Koo, Cho, Deok-Yong, Kim, Moo-Sung, Buchanan, Iain, Xiao, Manchao, Ivanov, Sergei, Hwang, Cheol Seong

    Published in Chemistry of materials (11-10-2016)
    “…In this report, a new method to deposit GeTe thin film by atomic layer deposition (ALD) is described. Ge­(N­(Si­(CH3)3)2)2, in which Ge is in +2 oxidation…”
    Get full text
    Journal Article
  12. 12

    Uniform Self-rectifying Resistive Switching Behavior via Preformed Conducting Paths in a Vertical-type Ta2O5/HfO2-x Structure with a Sub-μm(2) Cell Area by Yoon, Jung Ho, Yoo, Sijung, Song, Seul Ji, Yoon, Kyung Jean, Kwon, Dae Eun, Kwon, Young Jae, Park, Tae Hyung, Kim, Hye Jin, Shao, Xing Long, Kim, Yumin, Hwang, Cheol Seong

    Published in ACS applied materials & interfaces (20-07-2016)
    “…To replace or succeed the present NAND flash memory, resistive switching random access memory (ReRAM) should be implemented in the vertical-type crossbar array…”
    Get full text
    Journal Article
  13. 13

    Electrical Properties of ZrO2/Al2O3/ZrO2‐Based Capacitors with TiN, Ru, and TiN/Ru Top Electrode Materials by Lee, Woongkyu, An, Cheol Hyun, Yoo, Sijung, Jeon, Woojin, Chung, Min Jung, Kim, Sang Hyeon, Hwang, Cheol Seong

    “…To improve the electrical properties of metal/insulator/metal capacitors for dynamic random access memory, the effects of the top electrode materials and their…”
    Get full text
    Journal Article
  14. 14

    Combined Ligand Exchange and Substitution Reactions in Atomic Layer Deposition of Conformal Ge2Sb2Te5 Film for Phase Change Memory Application by Eom, Taeyong, Gwon, Taehong, Yoo, Sijung, Choi, Byung Joon, Kim, Moo-Sung, Buchanan, Iain, Ivanov, Sergei, Xiao, Manchao, Hwang, Cheol Seong

    Published in Chemistry of materials (26-05-2015)
    “…For phase change memories application, Ge–Sb–Te films were prepared by a stable and reliable atomic layer deposition (ALD) method. Ge­(OC2H5)4, Sb­(OC2H5)3,…”
    Get full text
    Journal Article
  15. 15

    Evaluating the Top Electrode Material for Achieving an Equivalent Oxide Thickness Smaller than 0.4 nm from an Al-Doped TiO2 Film by Jeon, Woojin, Yoo, Sijung, Kim, Hyo Kyeom, Lee, Woongkyu, An, Cheol Hyun, Chung, Min Jung, Cho, Cheol Jin, Kim, Seong Keun, Hwang, Cheol Seong

    Published in ACS applied materials & interfaces (10-12-2014)
    “…The effects of Pt and RuO2 top electrodes on the electrical properties of capacitors with Al-doped TiO2 (ATO) films grown on the RuO2 bottom electrode by an…”
    Get full text
    Journal Article
  16. 16
  17. 17
  18. 18
  19. 19

    Structural Analyses of Phase Stability in Amorphous and Partially Crystallized Ge-Rich GeTe Films Prepared by Atomic Layer Deposition by Gwon, Taehong, Mohamed, Ahmed Yousef, Yoo, Chanyoung, Park, Eui-sang, Kim, Sanggyun, Yoo, Sijung, Lee, Han-Koo, Cho, Deok-Yong, Hwang, Cheol Seong

    Published in ACS applied materials & interfaces (29-11-2017)
    “…The local bonding structures of Ge x Te1–x (x = 0.5, 0.6, and 0.7) films prepared through atomic layer deposition (ALD) with Ge­(N­(Si­(CH3)3)2)2 and…”
    Get full text
    Journal Article
  20. 20