Search Results - "Yoo, Sijung"
-
1
An analytical interpretation of the memory window in ferroelectric field-effect transistors
Published in Applied physics letters (27-11-2023)“…In this study, we present an analytical equation for describing the memory window of ferroelectric field-effect transistors (FeFETs). The analytical equation…”
Get full text
Journal Article -
2
Fermi-level unpinning in Pt/Al2O3/GaSb PMOS capacitors by sulphurization and rapid thermal annealing of GaSb surfaces
Published in Applied physics letters (15-08-2016)“…A facile route to mitigate the Fermi-level pinning between a p-type GaSb semiconductor and an Al2O3 dielectric is proposed. Combination of the sulphurization…”
Get full text
Journal Article -
3
Resistance switching behavior of atomic layer deposited SrTiO3 film through possible formation of Sr2Ti6O13 or Sr1Ti11O20 phases
Published in Scientific reports (02-02-2016)“…Identification of microstructural evolution of nanoscale conducting phase, such as conducting filament (CF), in many resistance switching (RS) devices is a…”
Get full text
Journal Article -
4
Nociceptive Memristor
Published in Advanced materials (Weinheim) (22-02-2018)“…The biomimetic characteristics of the memristor as an electronic synapse and neuron have inspired the advent of new information technology in the neuromorphic…”
Get full text
Journal Article -
5
Understanding the Coexistence of Two Bipolar Resistive Switching Modes with Opposite Polarity in Pt/TiO2/Ti/Pt Nanosized ReRAM Devices
Published in ACS applied materials & interfaces (05-09-2018)“…Redox-type resistive random access memories based on transition-metal oxides are studied as adjustable two-terminal devices for integrated network applications…”
Get full text
Journal Article -
6
Electro-Thermal Model for Thermal Disturbance in Cross-Point Phase-Change Memory
Published in IEEE transactions on electron devices (01-04-2020)“…We developed an electro-thermal model for cross-point phase-change memory (X-PCM) and compared the calculation values with the experimental results. In order…”
Get full text
Journal Article -
7
Multicolor Changeable Optical Coating by Adopting Multiple Layers of Ultrathin Phase Change Material Film
Published in ACS photonics (20-07-2016)“…The multilayered optical coating whose structure consists of optical cavity and multiple layers of ultrathin phase change material (PCM) film is presented. The…”
Get full text
Journal Article -
8
Influence of the Kinetic Adsorption Process on the Atomic Layer Deposition Process of (GeTe2)(1–x)(Sb2Te3) x Layers Using Ge4+–Alkoxide Precursors
Published in Chemistry of materials (25-02-2014)“…(GeTe2)(1–x)(Sb2Te3) x (GST) layers were deposited via atomic layer deposition (ALD) at growth temperatures ranging from 50 to 120 °C using Ge(OCH3)4 or…”
Get full text
Journal Article -
9
Laminated Ferroelectric FET With Large Memory Window and High Reliability
Published in IEEE transactions on electron devices (01-04-2024)“…In this work, we report a planar Si-based ferroelectric field-effect transistor (FEFET) characterized by a high memory window (MW) of 4.79 V, ten-year…”
Get full text
Journal Article -
10
Atomic Layer Deposition of GeTe and Ge–Sb–Te Films Using HGeCl3, Sb(OC2H5)3, and {(CH3)3Si}2Te and Their Reaction Mechanisms
Published in Chemistry of materials (10-10-2017)“…In this paper, a new atomic layer deposition (ALD) process for depositing binary GeTe and ternary Ge–Sb–Te thin films is reported, where HGeCl3 and…”
Get full text
Journal Article -
11
Atomic Layer Deposition of GeTe Films Using Ge{N[Si(CH3)3]2}2, {(CH3)3Si}2Te, and Methanol
Published in Chemistry of materials (11-10-2016)“…In this report, a new method to deposit GeTe thin film by atomic layer deposition (ALD) is described. Ge(N(Si(CH3)3)2)2, in which Ge is in +2 oxidation…”
Get full text
Journal Article -
12
Uniform Self-rectifying Resistive Switching Behavior via Preformed Conducting Paths in a Vertical-type Ta2O5/HfO2-x Structure with a Sub-μm(2) Cell Area
Published in ACS applied materials & interfaces (20-07-2016)“…To replace or succeed the present NAND flash memory, resistive switching random access memory (ReRAM) should be implemented in the vertical-type crossbar array…”
Get full text
Journal Article -
13
Electrical Properties of ZrO2/Al2O3/ZrO2‐Based Capacitors with TiN, Ru, and TiN/Ru Top Electrode Materials
Published in Physica status solidi. PSS-RRL. Rapid research letters (01-10-2018)“…To improve the electrical properties of metal/insulator/metal capacitors for dynamic random access memory, the effects of the top electrode materials and their…”
Get full text
Journal Article -
14
Combined Ligand Exchange and Substitution Reactions in Atomic Layer Deposition of Conformal Ge2Sb2Te5 Film for Phase Change Memory Application
Published in Chemistry of materials (26-05-2015)“…For phase change memories application, Ge–Sb–Te films were prepared by a stable and reliable atomic layer deposition (ALD) method. Ge(OC2H5)4, Sb(OC2H5)3,…”
Get full text
Journal Article -
15
Evaluating the Top Electrode Material for Achieving an Equivalent Oxide Thickness Smaller than 0.4 nm from an Al-Doped TiO2 Film
Published in ACS applied materials & interfaces (10-12-2014)“…The effects of Pt and RuO2 top electrodes on the electrical properties of capacitors with Al-doped TiO2 (ATO) films grown on the RuO2 bottom electrode by an…”
Get full text
Journal Article -
16
-
17
Atomic Layer Deposition of GeTe and Ge–Sb–Te Films Using HGeCl 3 , Sb(OC 2 H 5 ) 3 , and {(CH 3 ) 3 Si} 2 Te and Their Reaction Mechanisms
Published in Chemistry of materials (10-10-2017)Get full text
Journal Article -
18
-
19
Structural Analyses of Phase Stability in Amorphous and Partially Crystallized Ge-Rich GeTe Films Prepared by Atomic Layer Deposition
Published in ACS applied materials & interfaces (29-11-2017)“…The local bonding structures of Ge x Te1–x (x = 0.5, 0.6, and 0.7) films prepared through atomic layer deposition (ALD) with Ge(N(Si(CH3)3)2)2 and…”
Get full text
Journal Article -
20
Highly Enhanced Memory Window of 17.8V in Ferroelectric FET with IGZO Channel via Introduction of Intermediate Oxygen-Deficient Channel and Gate Interlayer
Published in 2024 IEEE Symposium on VLSI Technology and Circuits (VLSI Technology and Circuits) (16-06-2024)“…We demonstrated a novel Ferroelectric Field-Effect Transistor (FeFET) with an IGZO channel, featuring a record-high memory window (MW) of up to 17.8V. A…”
Get full text
Conference Proceeding