Search Results - "Yeap, K.B."
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1
Nanosecond Laser Anneal for BEOL Performance Boost in Advanced FinFETs
Published in 2018 IEEE Symposium on VLSI Technology (01-06-2018)“…Nanosecond laser-induced grain growth in Cu interconnects is demonstrated for the first time using 14nm FinFET technology. We achieved a 35% reduction in Cu…”
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2
The effect of oxidation on the corrosion resistance and mechanical properties of a Zr-based metallic glass
Published in Corrosion science (01-11-2011)“…After oxidation at 593 K for 5 h, the Zr-based metallic glass exhibits superior passivation behavior in 0.5 M NaCl solutions. The corrosion behavior of BMG in…”
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Journal Article -
3
Electromigration early failure void nucleation and growth phenomena in Cu and Cu(Mn) interconnects
Published in 2013 IEEE International Reliability Physics Symposium (IRPS) (01-04-2013)“…Electromigration early failure void nucleation and growth phenomena were studied using large-scale, statistical analysis methods. A total of about 496,000…”
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Conference Proceeding -
4
Thermal oxidation effect on corrosion behavior of Zr 46Cu 37.6Ag 8.4Al 8 bulk metallic glass
Published in Intermetallics (01-03-2012)“…Oxide films of 0.72 μm and 1.80 μm were prepared by thermal oxidation treatments at 441 K and 609 K respectively. The oxidation kinetics of the Zr 46Cu 37.6Ag…”
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5
A computational and experimental investigation of three-dimensional micro-wedge indentation-induced interfacial delamination in a soft-film-on-hard-substrate system
Published in Engineering structures (01-12-2011)“…A three-dimensional finite element (FEM) simulation was performed to study the mechanics of micro-wedge indentation-induced interfacial delamination of a soft…”
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6
Thermal oxidation effect on corrosion behavior of Zr46Cu37.6Ag8.4Al8 bulk metallic glass
Published in Intermetallics (01-03-2012)Get full text
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7
Finite element simulation and experimental determination of interfacial adhesion properties by wedge indentation
Published in Philosophical magazine (Abingdon, England) (11-06-2009)“…This paper presents our recent study on determination of interfacial adhesion properties of soft-film-on-hard-substrate (SFHS) systems using finite element…”
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8
Testing The Limits of TaN Barrier Scaling
Published in 2018 IEEE International Interconnect Technology Conference (IITC) (01-06-2018)“…Continued scaling dimensions of interconnects used for Si chip integration reduces the available cross sectional area for conduction. As Cu requires a…”
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Conference Proceeding