Search Results - "Yao, Jing Neng"
-
1
Evaluation of a 100-nm Gate Length E-Mode InAs High Electron Mobility Transistor With Ti/Pt/Au Ohmic Contacts and Mesa Sidewall Channel Etch for High-Speed and Low-Power Logic Applications
Published in IEEE journal of the Electron Devices Society (01-01-2018)“…In this paper, a 100-nm gate length InAs high electron mobility transistor (HEMT) with non-alloyed Ti/Pt/Au ohmic contacts and mesa sidewall channel etch was…”
Get full text
Journal Article -
2
A Recessed Source Contact Technology to Reduce the Specific On-Resistance of Power MOSFET on 4H-SiC
Published in IEEE electron device letters (01-10-2024)“…Reducing the on-resistance of SiC MOSFETs is crucial for lowering power losses and is a key aspect of MOSFET design. This letter proposes a recessed source…”
Get full text
Journal Article -
3
Enhancement-Mode GaN MIS-HEMTs With LaHfOx Gate Insulator for Power Application
Published in IEEE electron device letters (01-08-2017)“…This letter reports an E-mode GaN MIS-HEMT using a composite La 2 O 3 /HfO 2 gate insulator for power device applications. The composite dielectric formed an…”
Get full text
Journal Article -
4
Study of tri-gate AlGaN/GaN MOS-HEMTs for power application
Published in Micro and Nano Engineering (01-11-2020)“…In this letter, we present high-performance AlGaN/GaN high electron mobility transistor (HEMT) by 3-dimensional (3D) tri-gate. Due to the excellent channel…”
Get full text
Journal Article -
5
An Au-free GaN high electron mobility transistor with Ti/Al/W Ohmic metal structure
Published in 2015 IEEE 22nd International Symposium on the Physical and Failure Analysis of Integrated Circuits (01-06-2015)“…We demonstrate the Au-free GaN HEMT device with the Ti/Al/W Ohmic metal structure. Excellent surface roughness 4.88nm for Ti/Al/W Ohmic stucture was achieved…”
Get full text
Conference Proceeding -
6
Study of p-GaN Gate MOS-HEMT with Al2O3 Insulator for High-Power Applications
Published in Journal of electronic materials (01-04-2023)“…In this work, an enhancement-mode (E-mode) p-GaN gate metal–oxide–semiconductor high-electron-mobility transistor (MOS-HEMT) with 10-nm-thick Al 2 O 3 film was…”
Get full text
Journal Article -
7
Study of the mesa etched tri-gate InAs HEMTs with extremely low SS for low-power logic applications
Published in 2018 China Semiconductor Technology International Conference (CSTIC) (01-03-2018)“…InAs HEMTs with a mesa etch structure that connects the Schottky gate through mesa sidewall with InAlAs layers were fabricated. The gate metal connection to…”
Get full text
Conference Proceeding -
8
Hydrothermal crystallization and modification of surface hydroxyl groups of anodized TiO2 nanotube-arrays for more efficient photoenergy conversion
Published in Electrochimica acta (01-09-2012)“…[Display omitted] ► Hydrothermally crystallized nanotubes show improved cyrstallinity. ► Basic hydrothermal pH induces morphological transformation of the…”
Get full text
Journal Article -
9
Evaluation of an InAs HEMT with source-connected field plate for high-speed and low-power logic applications
Published in Solid-state electronics (01-07-2019)“…•We have edited the highlights as below and attached.•InAs HEMTs electrical performance improvement by SCFP.•SS of 76 mV/dec, DIBL of 44 mV/V, and Ion/Ioff of…”
Get full text
Journal Article -
10
WITHDRAWN: Study of tri-gate AlGaN/GaN MOS-HEMTs for power application
Published in Microelectronic engineering (01-05-2020)Get full text
Journal Article -
11
Study of E-Mode AlGaN/GaN MIS-HEMT with La-silicate Gate Insulator for Power Applications
Published in Journal of electronic materials (01-02-2020)“…An enhancement-mode (E-mode) AlGaN/GaN metal–insulator–semiconductor high-electron-mobility transistor (MIS-HEMT) with La 2 O 3 /SiO 2 gate insulator is…”
Get full text
Journal Article -
12
Enhancement-Mode GaN MIS-HEMTs With LaHfO x Gate Insulator for Power Application
Published in IEEE electron device letters (01-08-2017)Get full text
Journal Article -
13
Inx Ga1−x As materials for post CMOS application: Materials and device aspects
Published in 2014 IEEE International Conference on Electron Devices and Solid-State Circuits (01-06-2014)“…High mobility In x Ga 1-x As material is one of the most promising candidates as channel material for post CMOS device applications. In this presentation, In x…”
Get full text
Conference Proceeding -
14
-
15
Single Magnetic Atom on a Surface: Anisotropy Energy and Spin Density
Published 02-03-2012“…Studying single-atom magnetic anisotropy on surfaces enables the exploration of the smallest magnetic storage bit that can be built. In this work, magnetic…”
Get full text
Journal Article