Search Results - "Xiong, Pengpeng"
-
1
Characterization of the SWEET Gene Family in Longan (Dimocarpus longan) and the Role of DlSWEET1 in Cold Tolerance
Published in International journal of molecular sciences (10-08-2022)“…Sugars will eventually be exported transporters (SWEET), a group of relatively novel sugar transporters, that play important roles in phloem loading, seed and…”
Get full text
Journal Article -
2
Effect of spent mushroom substrate on strengthening the phytoremediation potential of Ricinus communis to Cd- and Zn-polluted soil
Published in International journal of phytoremediation (06-12-2018)“…Phytoremediation is a kind of efficient strategy for remediating soils polluted with heavy metals. The aim of this study was to investigate the influence of…”
Get full text
Journal Article -
3
Transparent electrodes based on ultrathin/ultra smooth Cu films produced through atomic layer deposition as new ITO-free organic light-emitting devices
Published in Organic electronics (01-07-2018)“…Ultrathin and continuous metallic films with mechanical robustness, high electrical conductivity and high elevated optical transparency are considered as ideal…”
Get full text
Journal Article -
4
Effect of Various Oxidants on Reaction Mechanisms, Self‐Limiting Natures and Structural Characteristics of Al2O3 Films Grown by Atomic Layer Deposition
Published in Advanced materials interfaces (23-07-2018)“…The present study investigates the Al2O3 films grown by low‐temperature atomic layer deposition (ALD) with water vapor (H2O), oxygen plasma (O2 plasma), and…”
Get full text
Journal Article -
5
The Cut-Off Phenomenon Effect on ZrO2 Growth Using Remote Plasma-Enhanced Atomic Layer Deposition
Published in Journal of physical chemistry. C (02-03-2017)“…Remote plasma-enhanced atomic layer deposition (R-PEALD) of zirconium dioxide (ZrO2) experiments were conducted using tetrakis(dimethylamino)zirconium…”
Get full text
Journal Article -
6
The Cut-Off Phenomenon Effect on ZrO 2 Growth Using Remote Plasma-Enhanced Atomic Layer Deposition
Published in Journal of physical chemistry. C (02-03-2017)Get full text
Journal Article -
7
40.5: TFT Overlaiding Materials For Decreasing Arounding Gap Mura
Published in SID International Symposium Digest of technical papers (01-09-2019)“…To overcome the arounding gap mura(AGM) problem of VA TFT LCD panels caused by the seewsaw effection of glass gravity[1‐2]. There are so many devices in GOA…”
Get full text
Journal Article -
8
Atomic Layer Deposition: Effect of Various Oxidants on Reaction Mechanisms, Self‐Limiting Natures and Structural Characteristics of Al2O3 Films Grown by Atomic Layer Deposition (Adv. Mater. Interfaces 14/2018)
Published in Advanced materials interfaces (23-07-2018)“…The reaction of atomic layer deposition (ALD) is a self‐limiting process, however, it is difficult to determine the reaction degree, because each oxidant has…”
Get full text
Journal Article -
9
-
10
Effect of Various Oxidants on Reaction Mechanisms, Self‐Limiting Natures and Structural Characteristics of Al 2 O 3 Films Grown by Atomic Layer Deposition
Published in Advanced materials interfaces (01-07-2018)“…The present study investigates the Al 2 O 3 films grown by low‐temperature atomic layer deposition (ALD) with water vapor (H 2 O), oxygen plasma (O 2 plasma),…”
Get full text
Journal Article -
11
Regulation of transcriptionally active genes via the catalytically inactive Cas9 in C. elegans and D. rerio
Published in Cell research (01-05-2015)“…Dear Editor, CRISPR interference (CRISPRi) is a recently devel- oped tool used to study single guide RNA (gRNA)-mediated sequence-specific repression of…”
Get full text
Journal Article