Search Results - "Wocko, Andreas"
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Study of relationship between 300 mm Si wafer surface and annealing temperatures for advanced semiconductor-based applications
Published in 2010 IEEE/SEMI Advanced Semiconductor Manufacturing Conference (ASMC) (01-07-2010)“…Surface morphology dependence on annealing conditions is one of the most important parameters that is being monitored in current manufacturing environments…”
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Conference Proceeding
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Wafer backside inspection applications in lithography
Published in Advanced Semiconductor Manufacturing Conference and Workshop, 2003 IEEEI/SEMI (2003)“…As the Semiconductor Industry starts to ramp its 110 nm production capacity, the need for optimal uniformity across the wafer surface becomes a very important…”
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Conference Proceeding