Search Results - "Wiaux, V"

Basic structures for photonic integrated circuits in Silicon-on-insulator by Bogaerts, W, Taillaert, D, Luyssaert, B, Dumon, P, Van Campenhout, J, Bienstman, P, Van Thourhout, D, Baets, R, Wiaux, V, Beckx, S

“…For the compact integration of photonic circuits, wavelength-scale structures with a high index contrast are a key requirement. We developed a fabrication…”
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Low-loss SOI photonic wires and ring resonators fabricated with deep UV lithography by Dumon, P., Bogaerts, W., Wiaux, V., Wouters, J., Beckx, S., Van Campenhout, J., Taillaert, D., Luyssaert, B., Bienstman, P., Van Thourhout, D., Baets, R.

“…We demonstrate single-mode photonic wires in silicon-on-insulator with propagation loss as low as 2.4 dB/cm, fabricated with deep ultraviolet lithography and…”
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Fabrication of photonic crystals in silicon-on-insulator using 248-nm deep UV lithography by Bogaerts, W., Wiaux, V., Taillaert, D., Beckx, S., Luyssaert, B., Bienstman, P., Baets, R.

“…We demonstrate wavelength-scale photonic nanostructures, including photonic crystals, fabricated in silicon-on-insulator using deep ultraviolet (UV)…”
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A compact photonic horizontal spot-size converter realized in silicon-on-insulator by Luyssaert, B., Vandersteegen, P., Taillaert, D., Dumon, P., Bogaerts, W., Bienstman, P., Van Thourhout, D., Wiaux, V., Beckx, S., Baets, R.

“…We present a compact planar coupler connecting two optical waveguides with highly different widths. The coupler consists of various nonperiodic waveguide…”
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Lithography Options for the 32 nm Half Pitch Node and Beyond by Ronse, K., Jansen, P., Gronheid, R., Hendrickx, E., Maenhoudt, M., Wiaux, V., Goethals, A.-M., Jonckheere, R., Vandenberghe, G.

“…Three major technological lithography options have been reviewed for high volume manufacturing at the 32 nm half pitch node: 193 nm immersion lithography with…”
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Experimental demonstration of high coupling efficiency between wide ridge waveguides and single-mode photonic Crystal waveguides by Sanchis, P., Garcia, J., Marti, J., Bogaerts, W., Dumon, P., Taillaert, D., Baets, R., Wiaux, V., Wouters, J., Beckx, S.

“…The experimental demonstration of a high efficiency coupling technique based on setting a single defect within a photonic crystal (PhC) taper is reported. The…”
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Nanophotonic waveguides in silicon-on-insulator fabricated with CMOS technology by Bogaerts, W., Baets, R., Dumon, P., Wiaux, V., Beckx, S., Taillaert, D., Luyssaert, B., Van Campenhout, J., Bienstman, P., Van Thourhout, D.

“…High-index-contrast, wavelength-scale structures are key to ultracompact integration of photonic integrated circuits. The fabrication of these nanophotonic…”
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Compact Wavelength-Selective Functions in Silicon-on-Insulator Photonic Wires by Bogaerts, Wim, Dumon, Pieter, Van Thourhout, Dries, Taillaert, Dirk, Jaenen, Patrick, Wouters, Johan, Beckx, Stephan, Wiaux, Vincent, Baets, Roel G.

“…We present a number of compact wavelength-selective elements implemented in silicon-on-insulator (SOI) photonic wires. These include arrayed waveguide gratings…”
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SOI nanophotonic waveguide structures fabricated with deep UV lithography by Bogaerts, W., Dumon, P., Taillaert, D., Wiaux, V., Beckx, S., Luyssaert, B., Van Campenhout, J., Van Thourhout, D., Baets, R.

“…To reduce the dimensions of photonic integrated circuits, high-contrast wavelength-scale structures are needed. We developed a fabrication process for…”
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Nanophotonic waveguides in silicon-on-insulator fabricated with CMOS technology by Bogaerts, W, Baets, R, Dumon, P, Wiaux, V, Beckx, S, Taillaert, D, Luyssaert, B, Van Campenhout, J, Bienstman, P, Van Thourhout, D

“…High-index-contrast, wavelength-scale structures are key to ultracompact integration of photonic integrated circuits. The fabrication of these nanophotonic…”
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Nanophotonic waveguides in silicon-on-insulator fabricated with CMOS technology by Bogaerts, W, Baets, R, Dumon, P, Wiaux, V, Beckx, S, Taillaert, D, Luyssaert, B, Van Campenhout, J, Bienstman, P, Van Thourhout, D

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A compact photonic horizontal spot-size converter realized in silicon-on-insulator by Luyssaert, B, Vandersteegen, P, Taillaert, D, Dumon, P, Bogaerts, W, Bienstman, P, Van Thourhout, D, Wiaux, V, Beckx, S, Baets, R

“…We present a compact planar coupler connecting two optical waveguides with highly different widths. The coupler consists of various nonperiodic waveguide…”
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Doppler-broadening of gamma rays following muon capture: search for scalar coupling by Shitov, Yu, Egorov, V., Briançon, Ch, Brudanin, V., Deutsch, J., Filipova, T., Petitjean, C., Prieels, R., Siiskonen, T., Suhonen, J., Vylov, Ts, Wiaux, V., Yutlandov, I., Zaparov, Sh

“…A precision measurement of the 277 keV γ ray produced by capturing muons in gaseous oxygen was performed using high-resolution HPGe detectors. The…”
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Integration of tall triple-gate devices with inserted-Ta/sub x/N/sub y/ gate in a 0.274/spl mu/m/sup 2/ 6T-SRAM cell and advanced CMOS logic circuits by Witters, L., Collaert, N., Nackaerts, A., Demand, M., Demuynek, S., Delvaux, C., Lauwers, A., Baerts, C., Beckx, S., Bouilart, W., Brus, S., Degroote, B., de Marneffe, J.F., Dixit, A., De Meyer, K., Ercken, M., Goodwin, M., Hendrickx, E., Heylen, N., Jaenen, P., Laidler, D., Leray, P., Locorotondo, S., Maenhoudt, M., Moclants, M., Pollentier, I., Ronse, K., Rooyackers, R., Van Aelst, J., Vandenberghe, G., Vandeweyer, T., Vanhaelemeersch, S., Van Hove, M., Van Olmen, J., Verhaegen, S., Versluijs, J., Vrancken, C., Wiaux, V., Willems, P., Wouters, J., Jurezak, M., Biesemans, S.

“…We present the fabrication process of a fully functional 0.274/spl mu/m2 6T-SRAM cell with inserted-Ta/sub x/N/sub y/ tall tripple gate devices. Several…”
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Spacer-Defined EUV Lithography Reducing Variability of 12nm NAND Flash Memories by Poliakov, P., Blomme, P., Pret, A. V., Corbalan, M. M., Gronheid, R., Wiaux, V., Versluijs, J., Verkest, D., Van Houdt, J., Dehaene, W.

“…The NAND Flash memory is the most scaled device nowadays and it is the best candidate to keep pace with the Moore's Law. However, highly scaled memory…”
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Muon capture by 11 B and the hyperfine effect by Wiaux, V., Prieels, R., Deutsch, J., Govaerts, J., Brudanin, V., Egorov, V., Petitjean, C., Truöl, P.

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Mask enhancer technology on ArF immersion tool for 45nm-node CMOS with 0.249/spl mu/m/sup 2/ SRAM contact layer fabrication by Yuito, T., Wiaux, V., Van Look, L., Vandenberghe, G., Irie, S., Matsuo, T., Misaka, A., Endo, M., Sasago, M.

“…We achieve the contact layer printing of 0.249/spl mu/m/sup 2/ SRAM by using mask enhancer (ME) technology and 0.85NA ArF immersion tool. In conclusion, we…”
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Novel low-loss 60/spl deg/ bends in photonic crystal waveguides by Thorhauge, M., Frandsen, L.H., Borel, P.I., Harpoth, A., Zhuang, Y.X., Kristensen, M., Bogaerts, W., Dumon, P., Baets, R., Wiaux, V., Wouters, J., Beckx, S.

“…A novel type of 60 degree photonic crystal waveguide bend has been designed, simulated and fabricated in silicon-on-insulator material utilizing deep…”
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Photonic Crystal Waveguides in SOI fabricated with deep UV lithography by W. Bogaerts, V. Wiaux, D. Taillaert, S. Beckx, R. Baets

“…We demonstrate photonic crystals for 1550 nm wavelengths fabricated with 248 nm-excimer laser deep UV lithography in silicon-on-insulator, combining high…”
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Fabrication of ultra-compact photonic structures in silicon-on-insulator (SOI) using 248 nm deep UV lithography by Bogaerts, W., Wiaux, V., Taillaert, D., Beckx, S., Baets, R.

“…We demonstrate the use of deep UV lithography for the fabrication of wavelength-scale photonic structures. Mass-fabricating ultra-compact structures like…”
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