Search Results - "Wellenius, Patrick"

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  1. 1

    Room temperature pulsed laser deposited indium gallium zinc oxide channel based transparent thin film transistors by Suresh, Arun, Wellenius, Patrick, Dhawan, Anuj, Muth, John

    Published in Applied physics letters (19-03-2007)
    “…Indium gallium zinc oxide deposited by pulsed laser deposition at room temperature was used as a channel layer to fabricate transparent thin film transistors…”
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    Journal Article
  2. 2

    Transparent, high mobility InGaZnO thin films deposited by PLD by Suresh, Arun, Gollakota, Praveen, Wellenius, Patrick, Dhawan, Anuj, Muth, John F.

    Published in Thin solid films (15-02-2008)
    “…Transparent oxide semiconductor, InGaZnO, thin films were prepared by pulsed laser deposition at room temperature. The carrier concentration was found to vary…”
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    Journal Article Conference Proceeding
  3. 3

    An Amorphous Indium-Gallium-Zinc-Oxide Active Matrix Electroluminescent Pixel by Wellenius, P., Suresh, A., Haojun Luo, Lunardi, L.M., Muth, J.F.

    Published in Journal of display technology (01-12-2009)
    “…In this study, an active matrix pixel was fabricated and characterized using indium gallium zinc oxide (IGZO) thin-film transistors and a novel…”
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    Journal Article
  4. 4

    Transparent indium gallium zinc oxide transistor based floating gate memory with platinum nanoparticles in the gate dielectric by Suresh, Arun, Novak, Steven, Wellenius, Patrick, Misra, Veena, Muth, John F.

    Published in Applied physics letters (23-03-2009)
    “…A transparent memory device has been developed based on an indium gallium zinc oxide thin film transistor by incorporating platinum nanoparticles in the gate…”
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    Journal Article
  5. 5

    Transparent IGZO-Based Logic Gates by Haojun Luo, Wellenius, P., Lunardi, L., Muth, J. F.

    Published in IEEE electron device letters (01-05-2012)
    “…Optically transparent indium-gallium-zinc-oxide-based nand and nor gates and inverters were fabricated and characterized using transistors deposited at room…”
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    Journal Article
  6. 6

    Fast All-Transparent Integrated Circuits Based on Indium Gallium Zinc Oxide Thin-Film Transistors by Suresh, A., Wellenius, P., Baliga, V., Luo, H., Lunardi, L.M., Muth, J.F.

    Published in IEEE electron device letters (01-04-2010)
    “…We describe the fabrication and characterization of visible transparent small-scale indium gallium zinc oxide (IGZO) integrated circuits. The IGZO channel and…”
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    Journal Article
  7. 7

    Effect of oxygen pressure on the structure and luminescence of Eu‐doped Gd 2 O 3 thin films by Wellenius, Patrick, Smith, Eric R., Wu, Pae C, Everitt, Henry O., Muth, John F.

    “…Europium‐doped gadolinium oxide (Gd 2 O 3 ) thin films were deposited on sapphire substrates by pulsed laser deposition (PLD). The effect of oxygen pressure…”
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    Journal Article
  8. 8

    Spectra and energy levels of Eu3+ in cubic phase Gd2O3 by Smith, Eric R., Gruber, John B., Wellenius, Patrick, Muth, John F., Everitt, Henry O.

    Published in Physica status solidi. B. Basic research (01-07-2010)
    “…In pulsed laser deposition of the sesquioxide semiconductor Gd2O3, adjusting the chamber oxygen pressure controls the crystalline structure of the host. This…”
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    Journal Article
  9. 9

    Effect of oxygen pressure on the structure and luminescence of Eu-doped Gd2O3 thin films by Wellenius, Patrick, Smith, Eric R., Wu, Pae C, Everitt, Henry O., Muth, John F.

    “…Europium‐doped gadolinium oxide (Gd2O3) thin films were deposited on sapphire substrates by pulsed laser deposition (PLD). The effect of oxygen pressure during…”
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    Journal Article
  10. 10

    Amorphous InGaZnO logic gates for transparent electronics by Haojun Luo, Wellenius, Patrick, Lunardi, Leda, Muth, John F

    Published in 68th Device Research Conference (01-06-2010)
    “…In this paper we present, transparent logic showing good performance from inverters, NAND and NOR gates, all deposited at room temperature. The significance of…”
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    Conference Proceeding
  11. 11
  12. 12

    High performance transparent thin film transistors based on indium gallium zinc oxide as the channel material by Suresh, A., Wellenius, P., Muth, J.F.

    “…The fabrication of high performance amorphous indium gallium zinc oxide (IGZO) transparent thin film transistors (TTFT) and their bias stress stability is…”
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    Conference Proceeding
  13. 13

    Rare-Earth Doped Wide Bandgap Oxide Semiconductor Materials and Devices by Wellenius, Ian Patrick

    Published 01-01-2009
    “…Amorphous oxide semiconductors composed of indium gallium zinc oxide are transparent to visible light and have higher electron mobilities than conventional…”
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    Dissertation
  14. 14

    High Mobility Indium Gallium Zinc Oxide for Transparent Conductive Contacts and Thin Film Transistors by Suresh, A., Wellenius, P., Muth, J.F.

    “…Thin amorphous films of high electron mobility, optically transparent indium gallium zinc oxide (IGZO) were deposited by pulsed laser deposition. Electrical…”
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    Conference Proceeding
  15. 15

    Rare-Earth Doped Wide Bandgap Oxide Semiconductor Materials and Devices by Wellenius, Ian Patrick

    “…Amorphous oxide semiconductors composed of indium gallium zinc oxide are transparent to visible light and have higher electron mobilities than conventional…”
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    Dissertation