Search Results - "Watanabe, Naoya"

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  1. 1

    Clinical outcomes of perforator-based propeller flaps versus free flaps in soft tissue reconstruction for lower leg and foot trauma: a retrospective single-centre comparative study by Ota, Mitsutoshi, Motomiya, Makoto, Watanabe, Naoya, Shimoda, Kohei, Iwasaki, Norimasa

    Published in BMC musculoskeletal disorders (16-04-2024)
    “…The efficacy and safety of perforator-based propeller flaps (PPF) versus free flaps (FF) in traumatic lower leg and foot reconstructions are debated. PPFs are…”
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    Journal Article
  2. 2

    Si-Backside Protection Circuits Against Physical Security Attacks on Flip-Chip Devices by Miki, Takuji, Nagata, Makoto, Sonoda, Hiroki, Miura, Noriyuki, Okidono, Takaaki, Araga, Yuuki, Watanabe, Naoya, Shimamoto, Haruo, Kikuchi, Katsuya

    Published in IEEE journal of solid-state circuits (01-10-2020)
    “…This article presents a cryptographic key protection technique from physical security attacks through Si-backside of IC chip. Flip-chip packaging leads to a…”
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  3. 3

    Efficacy of superficial femoral artery as a recipient in free flap reconstruction around the knee: Four case reports and a literature review by Ota, Mitsutoshi, Motomiya, Makoto, Watanabe, Naoya, Kitaguchi, Kazuya, Iwasaki, Norimasa

    Published in JPRAS open (01-12-2024)
    “…Reconstructing soft tissue defects around the knee with free flaps presents challenges in recipient vessel selection. Although the superficial femoral artery…”
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    Lifestyle factors associated with gastroesophageal reflux disease in the Japanese population by Matsuki, Nobuyuki, Fujita, Tsuyoshi, Watanabe, Naoya, Sugahara, Atsushi, Watanabe, Akihiko, Ishida, Tsukasa, Morita, Yoshinori, Yoshida, Masaru, Kutsumi, Hiromu, Hayakumo, Takanobu, Mukai, Hidekazu, Azuma, Takeshi

    Published in Journal of gastroenterology (01-03-2013)
    “…Background We aimed to clarify the lifestyle factors associated with erosive esophagitis and non-erosive reflux disease (NERD) in a Japanese population…”
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  6. 6

    A simple free flap strategy using end-to-side anastomosis to the main vessels in injured extremity by Motomiya, Makoto, Watanabe, Naoya, Ota, Mitsutoshi, Shimoda, Kohei, Kawamura, Daisuke, Iwasaki, Norimasa

    Published in JPRAS open (01-12-2023)
    “…BackgroundDuring free flap surgery, the surgeon sometimes encounters problems with anastomosis such as intractable arterial spasms or vessel size discrepancy…”
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  7. 7

    Residual stress investigation of via-last through-silicon via by polarized Raman spectroscopy measurement and finite element simulation by Feng, Wei, Watanabe, Naoya, Shimamoto, Haruo, Aoyagi, Masahiro, Kikuchi, Katsuya

    Published in Japanese Journal of Applied Physics (01-07-2018)
    “…The residual stresses induced around through-silicon vias (TSVs) by a fabrication process is one of the major concerns of reliability. We proposed a…”
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  8. 8

    Efficacy of the microscopic parachute end-to-side technique for creating large-to-small venous anastomoses in free flaps in the extremities by Motomiya, Makoto, Watanabe, Naoya, Ota, Mitsutoshi, Shimoda, Kohei, Kawamura, Daisuke, Iwasaki, Norimasa

    Published in JPRAS open (01-12-2022)
    “…The availability of reliable and suitably sized veins is limited for creating free flaps to treat severe trauma and infection, and it is important to manage…”
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  9. 9

    Validation of TSV thermo-mechanical simulation by stress measurement by Feng, Wei, Watanabe, Naoya, Shimamoto, Haruo, Aoyagi, Masahiro, Kikuchi, Katsuya

    Published in Microelectronics and reliability (01-04-2016)
    “…Because of the large mismatch in coefficients of thermal expansion (CTE) between copper vias and the silicon substrate in through-silicon vias (TSVs), thermal…”
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  10. 10

    Fabrication and stress analysis of annular-trench-isolated TSV by Feng, Wei, Bui, Tung Thanh, Watanabe, Naoya, Shimamoto, Haruo, Aoyagi, Masahiro, Kikuchi, Katsuya

    Published in Microelectronics and reliability (01-08-2016)
    “…The large mismatches among the coefficients of thermal expansion (CTE) of the metal via, insulator liner, and Si substrate of the through-silicon via (TSV)…”
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  11. 11

    Fabrication and stacking of through-silicon-via array chip formed by notchless Si etching and wet cleaning of first metal layer by Watanabe, Naoya, Kikuchi, Hidekazu, Yanagisawa, Azusa, Shimamoto, Haruo, Kikuchi, Katsuya, Aoyagi, Masahiro, Nakamura, Akio

    Published in Japanese Journal of Applied Physics (01-06-2019)
    “…We combined a "via-last through-silicon via (TSV) process consisting of notchless Si etching and wet cleaning of the first metal layer" with the solder bonding…”
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  12. 12

    Simultaneous Bilateral Proximal Humerus Fractures Treated with Single-Stage Bilateral Reverse Shoulder Arthroplasty by Tokuhiro, Taiki, Urita, Atsushi, Kameda, Yusuke, Motomiya, Makoto, Watanabe, Naoya, Iwasaki, Norimasa

    Published in Case reports in orthopedics (20-04-2022)
    “…Introduction. Simultaneous bilateral fractures of the proximal humerus are infrequent, and simultaneous bilateral three- or four-part fractures are even rarer…”
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  13. 13

    Development of a high-yield via-last through silicon via process using notchless silicon etching and wet cleaning of the first metal layer by Watanabe, Naoya, Kikuchi, Hidekazu, Yanagisawa, Azusa, Shimamoto, Haruo, Kikuchi, Katsuya, Aoyagi, Masahiro, Nakamura, Akio

    Published in Japanese Journal of Applied Physics (01-07-2017)
    “…A high-yield via-last through silicon via (TSV) process has been developed using notchless Si etching and wet cleaning of the first metal layer. In this…”
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  14. 14
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    Fabrication of Back-Side Illuminated Complementary Metal Oxide Semiconductor Image Sensor Using Compliant Bump by Watanabe, Naoya, Tsunoda, Isao, Takao, Takayuki, Tanaka, Koichiro, Asano, Tanemasa

    Published in Japanese Journal of Applied Physics (01-04-2010)
    “…We fabricated a back-side illuminated (BSI) complementary metal oxide semiconductor (CMOS) image sensor in which a very-thin BSI photodiode array chip was…”
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    Novel through silicon via exposure process comprising Si/Cu grinding, electroless Ni-B plating, and wet etching of Si by Watanabe, Naoya, Aoyagi, Masahiro, Katagawa, Daisuke, Bandoh, Tsubasa, Yamamoto, Eiichi

    Published in Japanese Journal of Applied Physics (01-05-2014)
    “…We proposed a novel through silicon via (TSV) exposure process comprising Si/Cu grinding, electroless Ni-B plating, and wet etching of Si. To grind Cu and Si…”
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  18. 18

    Investigation of metal contamination induced by a through silicon via reveal process using direct Si/Cu grinding and residual metal removal by Watanabe, Naoya, Aoyagi, Masahiro, Katagawa, Daisuke, Bandoh, Tsubasa, Mitsui, Takahiko, Yamamoto, Eiichi

    Published in Japanese Journal of Applied Physics (01-06-2016)
    “…We investigated metal contamination induced by a through silicon via (TSV) reveal process using direct Si/Cu grinding and residual metal removal. A…”
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  19. 19

    Damage Evaluation of Wet-Chemical Si-Wafer Thinning/Backside Via Exposure Process by Watanabe, Naoya, Miyazaki, Takumi, Yoshikawa, Kazuhiro, Aoyagi, Masahiro

    “…To realize low-cost and damage-less through silicon via (TSV) formation, we evaluated the damage caused by a new wet-chemical Si-wafer thinning/backside via…”
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  20. 20

    Fabrication of a membrane probe card using transparent film for three-dimensional integrated circuit testing by Watanabe, Naoya, Suzuki, Motohiro, Kawano, Kenji, Eto, Michiyuki, Aoyagi, Masahiro

    Published in Japanese Journal of Applied Physics (01-06-2014)
    “…We fabricated a novel membrane probe card using a transparent film for the chip-level testing of a three-dimensional integrated circuit (3D-IC). In this…”
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